电子功能外延薄膜的电沉积

doi:10.13208/j.electrochem.2213006

摘要/Abstract

摘要：

电沉积作为一种在温和条件下从溶液中合成材料的技术已被广泛应用于在导体和半导体基底表面合成各种功能材料。电沉积一般由人为施加于基底的电刺激（如：施加电位/电流）来触发。这种电刺激通过氧化或还原靠近基底表面的溶液层内部的离子、分子或配合物从而使该溶液层偏离其热力学平衡状态,随后引起目标产物在基底表面的沉积。在电沉积过程中, 许多实验参数都可能从不同的方面对沉积物的物化性质造成影响。迄今为止,已通过电沉积制备出多种单质（包括金属和非金属单质）、化合物（例如：金属氧化物、金属氢氧化物、金属硫化物等）以及复合材料。电沉积制备的这些材料大多为多晶、织构或外延薄膜的形式。其中, 外延薄膜是一种具有特定的面外和面内晶体生长取向且其晶体取向受基底控制的类单晶薄膜。由于外延薄膜中高度有序的原子排列,它们常呈现出独特的电磁性质。本文总结了常见的电沉积合成路线及影响沉积物外延生长的关键实验因素。此外, 本文简要介绍了用于表征外延薄膜的技术。最后, 本文还讨论了一些采用电沉积制备的具有特殊电子、电磁及光电特性的功能外延薄膜。

关键词: 电沉积, 电镀, 薄膜, 高度定向

Abstract:

Electrodeposition is a solution-based synthesis technique that can be used to fabricate various functional materials on conductive or semiconductive substrates under ambient conditions. Electrodeposition is usually triggered by an artificial electric stimulation (i.e., applied potential/current) to the substrate to oxidize or reduce ions, molecules, or complexes in the deposition solution layer near the substrate surface, which drives this solution layer to depart from its thermodynamic equilibrium and consequently causes the assembly of targeted deposits on the substrate. During electrodeposition, many experimental parameters could affect the properties of the deposits in different ways. To date, many elements (both metals and nonmetals), compounds (e.g., metal oxides, hydroxides, and chalcogenides), and composites have been electrodeposited, mostly as either polycrystalline, textured, or epitaxial films. Among them, the epitaxial films are a kind of single-crystal-like films grown with certain out-of-plane and in-plane orientations. Due to the highly ordered atomic arrangement in epitaxial films, they usually exhibit unique electric and magnetic properties. In this review, the common synthetic routes for the electrodeposition as well as the key experimental parameters that affect the epitaxial growth of the deposits are summarized. Besides, techniques used to characterize epitaxial films are briefly introduced. Furthermore, the electrodeposited functional epitaxial films with special electronic, electromagnetic, and photovoltaic properties are discussed.

Key words: electrodeposit, electroplating, thin film, highly oriented

黄葵, 黄容姣, 刘素琴, 何震. 电子功能外延薄膜的电沉积[J]. 电化学（中英文）, 2022, 28(7): 2213006.

Kui Huang, Rong-Jiao Huang, Su-Qin Liu, Zhen He. Electrodeposition of Functional Epitaxial Films for Electronics[J]. Journal of Electrochemistry, 2022, 28(7): 2213006.

导出引用管理器 EndNote|Ris|BibTeX

链接本文: https://electrochem.xmu.edu.cn/CN/10.13208/j.electrochem.2213006

https://electrochem.xmu.edu.cn/CN/Y2022/V28/I7/2213006

图/表 6

参考文献 113

[1]	Kang D, Kim T W, Kubota S R, Cardiel A C, Cha H G, Choi K S. Electrochemical synthesis of photoelectrodes and catalysts for use in solar water splitting[J]. Chem. Rev., 2015, 115(23): 12839-12887. doi: 10.1021/acs.chemrev.5b00498 URL
[2]	Switzer J A, Hodes G. Electrodeposition and chemical bath deposition of functional nanomaterials[J]. MRS Bull., 2010, 35(10): 743-752. doi: 10.1557/S0883769400051253 URL
[3]	Gusley R, Ezzat S, Coffey K R, West A C, Barmak K. Influence of the seed layer and electrolyte on the epitaxial electrodeposition of Co(0001) for the fabrication of single crystal interconnects[J]. J. Electrochem. Soc., 2020, 167(16): 162503. doi: 10.1149/1945-7111/abcd13 URL
[4]	Choi K S, Jang H S, McShane C M, Read C G, Seabold J A. Electrochemical synthesis of inorganic polycrystalline ele-ctrodes with controlled architectures[J]. MRS Bull., 2010, 35(10): 753-760. doi: 10.1557/mrs2010.504 URL
[5]	Zhang Y H, An M Z, Yang P X, Zhang J Q. Recent advances in electroplating of through-hole copper interconnection[J]. Electrocatalysis, 2021, 12(6): 619-627. doi: 10.1007/s12678-021-00687-2 URL
[6]	Gundel A, Devolder T, Chappert C, Schmidt J E, Cortes R, Allongue P. Electrodeposition of Fe/Au(111) ultrathin layers with perpendicular magnetic anisotropy[J]. Phys. B: Condens. Matter, 2004, 354(1-4): 282-285. doi: 10.1016/j.physb.2004.09.068 URL
[7]	Sorenson T A, Morton S A, Waddill G D, Switzer J A. Epitaxial electrodeposition of Fe₃O₄ thin films on the low-index planes of gold[J]. J. Am. Chem. Soc., 2002, 124(25): 7604-7609. pmid: 12071770
[8]	He Z, Koza J A, Mu G J, Miller A S, Bohannan E W, Switzer J A. Electrodeposition of Co_xFe_3-_xO₄ epitaxial films and superlattices[J]. Chem. Mater., 2013, 25(2): 223-232. doi: 10.1021/cm303289t URL
[9]	Koza J A, Hill J C, Demster A C, Switzer J A. Epitaxial electrodeposition of methylammonium lead Iodide perovskites[J]. Chem. Mater., 2016, 28(1): 399-405. doi: 10.1021/acs.chemmater.5b04524 URL
[10]	Luo B, Banik A, Bohannan E W, Switzer J A. Epitaxial electrodeposition of hole transport CuSCN nanorods on Au(111) at the wafer scale and lift-off to produce flexible and transparent foils[J]. Chem. Mater., 2022, 34(3): 970-978. doi: 10.1021/acs.chemmater.1c02694 URL
[11]	Yan Z H, Liu H H, Hao Z M, Yu M, Chen X, Chen J. Electrodeposition of (hydro)oxides for an oxygen evolution electrode[J]. Chem. Sci., 2020, 11(39): 10614-10625. doi: 10.1039/D0SC01532F URL
[12]	Pu J, Shen Z H, Zhong C L, Zhou Q W, Liu J Y, Zhu J, Zhang H G. Electrodeposition technologies for Li-based batteries: New frontiers of energy storage[J]. Adv. Mater., 2019, 32(27): 1903808.
[13]	Allongue P, Maroun F. Electrodeposited magnetic layers in the ultrathin limit[J]. MRS Bull., 2010, 35(10): 761-770.
[14]	Hangarter C M, Liu Y, Pagonis D, Bertocci U, Moffat T P. Electrodeposition of ternary Pt_100-_x_-_yCo_xNi_y alloys[J]. J. Electrochem. Soc., 2014, 161(1): D31-D43. doi: 10.1149/2.022401jes URL
[15]	Herrick R D, Kaplan A S, Chinh B K, Shane M J, Sailor M J, Kavanagh K L, McCreey R L, Zhao J. Room-temperature electrosynthesis of carbonaceous fibers[J]. Adv. Mater., 1995, 7(4): 398-401. doi: 10.1002/adma.19950070412 URL
[16]	Mahenderkar N K, Liu Y C, Koza J A, Switzer J A. Electrodeposited germanium nanowires[J]. ACS Nano, 2014, 8(9): 9524-9530. doi: 10.1021/nn503784d pmid: 25157832
[17]	Munisamy T, Bard A J. Electrodeposition of Si from organic solvents and studies related to initial stages of Si growth[J]. Electrochim. Acta, 2010, 55(11): 3797-3803. doi: 10.1016/j.electacta.2010.01.097 URL
[18]	Kothari H M, Kulp E A, Limmer S J, Poizot P, Bohannan E W, Switzer J A. Electrochemical deposition and characterization of Fe₃O₄ films produced by the reduction of Fe(III)-triethanolamine[J]. J. Mater. Res., 2006, 21(1): 293-301. doi: 10.1557/jmr.2006.0030 URL
[19]	Koza J A, He Z, Miller A S, Switzer J A. Electrodeposition of crystalline Co₃O₄-A catalyst for the oxygen evolution reaction[J]. Chem. Mater., 2012, 24(18): 3567-3573. doi: 10.1021/cm3012205 URL
[20]	Koza J A, Schroen I P, Willmering M M, Switzer J A. Electrochemical synthesis and nonvolatile resistance switching of Mn₃O₄ thin films[J]. Chem. Mater., 2014, 26(15): 4425-4432. doi: 10.1021/cm5014027 URL
[21]	Kulp E A, Kothari H M, Limmer S J, Yang J B, Gudavarthy R V, Bohannan E W, Switzer J A. Electrodeposition of epitaxial magnetite films and ferrihydrite nanoribbons on single-crystal gold[J]. Chem. Mater., 2009, 21(21): 5022-5031. doi: 10.1021/cm9013514 URL
[22]	Hill J C, Koza J A, Switzer J A. Electrodeposition of epitaxial lead Iodide and conversion to textured methylammonium lead Iodide perovskite[J]. ACS Appl. Mater. Interfaces, 2015, 7(47): 26012-26016. doi: 10.1021/acsami.5b07222 URL
[23]	Banik A, Bohannan E W, Switzer J A. Epitaxial electro-deposition of BiI₃and topotactic conversion to highly ordered solar light-absorbing perovskite (CH₃NH₃)₃Bi₂I₉[J]. Chem. Mater., 2020, 32(19): 8367-8372. doi: 10.1021/acs.chemmater.0c02304 URL
[24]	Therese G H A, Kamath P V. Electrochemical synthesis of metal oxides and hydroxides[J]. Chem. Mater., 2000, 12(5): 1195-1204. doi: 10.1021/cm990447a URL
[25]	Yan Z H, Sun H M, Chen X, Liu H H, Zhao Y R, Li H X, Xie W, Cheng F Y, Chen J. Anion insertion enhanced electrodeposition of robust metal hydroxide/oxide electrodes for oxygen evolution[J]. Nat. Commun., 2018, 9: 2373. doi: 10.1038/s41467-018-04788-3 URL
[26]	Lv Y, Zhang Z A, Lai Y Q, Liu Y X. Electrodeposition of porous Mg(OH)₂ thin films composed of single-crystal nanosheets[J]. J. Electrochem. Soc., 2012, 159(4): D187-D189. doi: 10.1149/2.019204jes URL
[27]	Aghazadeh M, Dalvand S, Hosseinifard M. Facile electrochemical synthesis of uniform β-Co(OH)₂ nanoplates for high performance supercapacitors[J]. Ceram. Int., 2014, 40(2): 3485-3493. doi: 10.1016/j.ceramint.2013.09.081 URL
[28]	Kulp E A, Switzer J A. Electrochemical biomineralization: The deposition of calcite with chiral morphologies[J]. J. Am. Chem. Soc., 2007, 129(49): 15120-15121. doi: 10.1021/ja076303b URL
[29]	Limmer S J, Kulp E A, Switzer J A. Epitaxial electrodeposition of ZnO on Au(111) from alkaline solution: Exploiting amphoterism in Zn(II)[J]. Langmuir, 2006, 22(25): 10535-10539. doi: 10.1021/la061185b URL
[30]	Poizot P, Hung C J, Nikiforov M P, Bohannan E W, Switzer J A. An electrochemical method for CuO thin film deposition from aqueous solution[J]. Electrochem. Solid-State Lett., 2003, 6(2): C21-C25. doi: 10.1149/1.1535753 URL
[31]	Han S, Liu S Q, Yin S J, Chen L, He Z. Electrodeposited Co-Doped Fe₃O₄ thin films as efficient catalysts for the oxygen evolution reaction[J]. Electrochim. Acta, 2016, 210: 942-949. doi: 10.1016/j.electacta.2016.05.194 URL
[32]	Hssi A A, Atourki L, Abouabassi K, Elfanaoui A, Bouabid K, Ihall A, Benmokhtar S, Ouafi M. Growth and characterization of Cu₂O for solar cells applications[M]. USA: Amer Inst Physics, 2018.
[33]	Siegfried M J, Choi K S. Directing the architecture of cuprous oxide crystals during electrochemical growth[J]. Angew. Chem. Int. Ed., 2005, 44(21): 3218-3223. doi: 10.1002/anie.200463018 URL
[34]	Li D J, Liu S Q, Ye G Y, Zhu W W, Zhao K M, Luo M, He Z. One-step electrodeposition of Ni_xFe_3-_xO₄/Ni hybrid nanosheet arrays as highly active and robust electrocatalysts for the oxygen evolution reaction[J]. Green Chem., 2020, 22(5): 1710-1719. doi: 10.1039/D0GC00168F URL
[35]	Zhou S M. Electrodeposition of metals: Principles and methods[M]. Shanghai: Shanghai Scientific & Technical Publishers, 1987.
[36]	Tu Z M, An M Z, Hu H L. Modern alloy electrodeposition theory and technology[M]. Beijing: National Defense Industry Press, 2016.
[37]	Paunovic M, Schlesinger M. Fundamentals of electrochemical deposition[M]. USA: John Wiley & Sons, Inc., 2006.
[38]	Nikiforov M P, Vertegel A, Shumsky M G, Switzer J A. Epitaxial electrodeposition of Fe₃O₄ on single-crystal Au(111)[J]. Adv. Mater., 2000, 12(18): 1351-1353. doi: 10.1002/1521-4095(200009)12:18<1351::AID-ADMA1351>3.0.CO;2-# URL
[39]	Liu R, Vertegel A A, Bohannan E W, Sorenson T A, Switzer J A. Epitaxial electrodeposition of zinc oxide nanopillars on single-crystal gold[J]. Chem. Mater., 2001, 13(2): 508-512. doi: 10.1021/cm000763l URL
[40]	Bohannan E W, Shumsky M G, Switzer J A. Epitaxial electrodeposition of copper(I) oxide on single-crystal gold (100)[J]. Chem. Mater., 1999, 11(9): 2289-2291. doi: 10.1021/cm990304o URL
[41]	Bohannan E W, Kothari H M, Nicic I M, Switzer J A. En-antiospecific electrodeposition of chiral CuO films on single-crystal Cu(111)[J]. J. Am. Chem. Soc., 2004, 126(2): 488-489. pmid: 14719945
[42]	Liu R, Kulp E A, Oba F, Bohannan E W, Ernst F, Switzer J A. Epitaxial electrodeposition of high-aspect-ratio Cu₂O(110) nanostructures on InP(111)[J]. Chem. Mater., 2005, 17(4): 725-729. doi: 10.1021/cm048296l URL
[43]	Lincot D, Kampmann A, Mokili B, Vedel J, Cortes R, Froment M. Epitaxial electrodeposition of CdTe films on InP from aqueous solutions: role of a chemically deposited CdS intermediate layer[J]. Appl. Phys. Lett., 1995, 67(16): 2355-2357. doi: 10.1063/1.114343 URL
[44]	Switzer J A, Hill J C, Mahenderkar N K, Liu Y C. Nano-meter-thick gold on silicon as a proxy for single-crystal gold for the electrodeposition of epitaxial cuprous oxide thin films[J]. ACS Appl. Mater. Interfaces, 2016, 8(24): 15828-15837. doi: 10.1021/acsami.6b04552 URL
[45]	Mahenderkar N K, Chen Q Z, Liu Y C, Duchild A R, Hofheins S, Chason E, Switzer J A. Epitaxial lift-off of electrodeposited single-crystal gold foils for flexible electronics[J]. Science, 2017, 355(6330): 1203-1206. doi: 10.1126/science.aam5830 pmid: 28302857
[46]	Hull C M, Switzer J A. Electrodeposited epitaxial Cu(100) on Si(100) and lift-off of single crystal-like Cu(100) foils[J]. ACS Appl. Mater. Interfaces, 2018, 10(44): 38596-38602. doi: 10.1021/acsami.8b13188 URL
[47]	Luo B, Banik A, Bohannan E W, Switzer J A. Epitaxial electrodeposition of Cu(111) onto an L-cysteine self-assembled monolayer on Au(111) and epitaxial lift-off of single-crystal-like Cu foils for flexible electronics[J]. J. Phys. Chem. C, 2020, 124(39): 21426-21434. doi: 10.1021/acs.jpcc.0c05425 URL
[48]	Chen Q Z, Switzer J A. Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers[J]. J. Mater. Chem. C, 2019, 7(6): 1720-1725. doi: 10.1039/C8TC06002A URL
[49]	Switzer J A, Liu R, Bohannan E W, Ernst F. Epitaxial electrodeposition of a crystalline metal oxide onto single-crystalline silicon[J]. J. Phys. Chem. B, 2002, 106(48): 12369-12372. doi: 10.1021/jp0266188 URL
[50]	Switzer J A, Kothari H M, Bohannan E W. Thermodynamic to kinetic transition in epitaxial electrodeposition[J]. J. Phys. Chem. B, 2002, 106(16): 4027-4031. doi: 10.1021/jp014638o URL
[51]	Nakanishi S, Lu G T, Kothari H M, Bohannan E W, Switzer J A. Epitaxial electrodeposition of Prussian blue thin films on single-crystal Au(110)[J]. J. Am. Chem. Soc., 2003, 125(49): 14998-14999. pmid: 14653729
[52]	Gudavarthy R V, Gorantla S, Mu G J, Kulp E A, Gemming T, Eckert J, Switzer J A. Epitaxial electrodeposition of Fe₃O₄ on single-crystal Ni(111)[J]. Chem. Mater., 2011, 23(8): 2017-2019. doi: 10.1021/cm2002176 URL
[53]	Kelso M V, Tubbesing J Z, Chen Q Z, Switzer J A. Epitaxial electrodeposition of chiral metal surfaces on silicon(643)[J]. J. Am. Chem. Soc., 2018, 140(46): 15812-15819. doi: 10.1021/jacs.8b09108 URL
[54]	Vertegel A A, Bohannan E W, Shumsky M G, Switzer J A. Epitaxial electrodeposition of orthorhombic α-PbO₂ on (100)-oriented single crystal Au[J]. J. Electrochem. Soc., 2001, 148(4): C253-C256. doi: 10.1149/1.1353571 URL
[55]	Cheng S Y, Chen G A, Chen Y Q, Huang C C. Effect of deposition potential and bath temperature on the electro-deposition of SnS film[J]. Opt. Mater., 2006, 29(4): 439-444. doi: 10.1016/j.optmat.2005.10.018 URL
[56]	Govindaraju G V, Wheeler G P, Lee D, Choi K S. Methods for electrochemical synthesis and photoelectrochemical characterization for photoelectrodes[J]. Chem. Mater., 2017, 29(1): 355-370. doi: 10.1021/acs.chemmater.6b03469 URL
[57]	Leistner K, Duschek K, Zehner J, Yang M Z, Petr A, Nielsch K, Kavanagh K L. Role of hydrogen evolution during epitaxial electrodeposition of Fe on GaAs[J]. J. Ele-ctrochem. Soc., 2018, 165(4): H3076-H3079.
[58]	Gusley R, Sentosun K, Ezzat S, Coffey K R, West A C, Barmak K. Electrodeposition of epitaxial Co on Ru(0001)/Al₂O₃(0001)[J]. J. Electrochem. Soc., 2019, 166(15): D875-D881. doi: 10.1149/2.1091915jes
[59]	Gabe D R. The role of hydrogen in metal electrodeposition processes[J]. J. Appl. Electrochem., 1997, 27(8): 908-915. doi: 10.1023/A:1018497401365 URL
[60]	Liu R, Bohannan E W, Switzer J A, Oba F, Ernst F. Epitaxial electrodeposition of Cu₂O films onto InP(001)[J]. Appl. Phys. Lett., 2003, 83(10): 1944-1946. doi: 10.1063/1.1606503 URL
[61]	Liu R, Oba F, Bohannan E W, Ernst F, Switzer J A. Shape control in epitaxial electrodeposition: Cu₂O nano-cubes on InP(001)[J]. Chem. Mater., 2003, 15(26): 4882-4885. doi: 10.1021/cm034807c URL
[62]	Hainey M, Robin Y, Amano H, Usami N. Pole figure analysis from electron backscatter diffraction-an effective method of evaluating fiber-textured silicon thin films as seed layers for epitaxy[J]. Appl. Phys. Express, 2019, 12(2): 025501. doi: 10.7567/1882-0786/aafb26 URL
[63]	Wei Y M, Fu Y C, Yan J W, Sun C F, Shi Z, Xie Z X, Wu D Y, Mao B W. Growth and shape-ordering of iron nanostructures on Au single crystalline electrodes in an ionic liquid: A paradigm of magnetostatic coupling[J]. J. Am. Chem. Soc., 2010, 132(23): 8152-8157. doi: 10.1021/ja1021816 URL
[64]	Fu Y C, Yan J W, Wang Y, Tian J H, Zhang H M, Xie Z X, Mao B W. In situ STM studies on the underpotential deposition of antimony on Au(111) and Au(100) in a BMIBF₄ ionic liquid[J]. J. Phys. Chem. C, 2007, 111(28): 10467-10477. doi: 10.1021/jp071162l URL
[65]	Lin L G, Yan J W, Wang Y, Fu Y C, Mao B W. An in situ STM study of cobalt electrodeposition on Au(111) in BMIBF₄ ionic liquid[J]. J. Exp. Nanosci., 2006, 1(3): 269-278. doi: 10.1080/17458080601009643 URL
[66]	Deng B, Pang Z Q, Chen S L, Li X, Meng C X, Li J Y, Liu M X, Wu J X, Qi Y, Dang W H, Yang H, Zhang Y F, Zhang J, Kang N, Xu H Q, Fu Q, Qiu X H, Gao P, Wei Y J, Liu Z F, Peng H L. Wrinkle-free single-crystal graphene wafer grown on strain-engineered substrates[J]. ACS Nano, 2017, 11(12): 12337-12345. doi: 10.1021/acsnano.7b06196 URL
[67]	Geiss R H, Read D T, Seiler D G, Diebold A C, McDonald R, Garner C M, Herr D, Khosla R P, Secula E M. Need for standardization of EBSD measurements for microstructural characterization of thin film structures[M]. USA: AMER INST PHYSICS, 2007.
[68]	Cachet H, Cortes R, Froment M, Maurin G. Epitaxial electrodeposition of cadmium selenide thin films on indium phosphide single crystal[J]. J. Solid State Electrochem., 1997, 1(1): 100-107. doi: 10.1007/s100080050029 URL
[69]	Munford M L, Cortes R, Allongue P. The preparation of ideally ordered flat H-Si(111) surfaces[J]. Sens. Mater., 2001, 13(5): 259-269.
[70]	Munford M L, Maroun F, Cortes R, Allongue P, Pasa A A. Electrochemical growth of gold on well-defined vicinal H-Si(111) surfaces studied by AFM and XRD[J]. Surf. Sci., 2003, 537(1-3): 95-112. doi: 10.1016/S0039-6028(03)00563-6 URL
[71]	Prod′homme P, Maroun F, Cortes R, Allongue P. Electrochemical growth of ultraflat Au(111) epitaxial buffer layers on H-Si(111)[J]. Appl. Phys. Lett., 2008, 93(17): 171901. doi: 10.1063/1.3006064 URL
[72]	Warren S, Prod′homme P, Maroun F, Allongue P, Cortes R, Ferrero C, Lee T L, Cowie B C C, Walker C J, Ferrer S, Zegenhagen J. Electrochemical Au deposition on stepped Si(111)-H surfaces: 3D versus 2D growth studied by AFM and X-ray diffraction[J]. Surf. Sci., 2009, 603(9): 1212-1220. doi: 10.1016/j.susc.2009.03.004 URL
[73]	Prodhomme P, Warren S, Cortes R, Jurca H F, Maroun F, Allongue P. Epitaxial growth of gold on H-Si(111): The determining role of hydrogen evolution[J]. Chem. Phys. Chem., 2010, 11(13): 2992-3001.
[74]	Akhtari-Zavareh A, Li W J, Maroun F, Allongue P, Kavanagh K L. Improved chemical and electrical stability of gold silicon contacts via epitaxial electrodeposition[J]. J. Appl. Phys., 2013, 113(6): 063708. doi: 10.1063/1.4792000 URL
[75]	Zambelli T, Munford M L, Pillier F, Bernard M C, Allongue P. Cu electroplating on H-terminated n-Si(111)-properties and structure of n-Si/Cu junctions[J]. J. Electrochem. Soc., 2001, 148(9): C614-C619. doi: 10.1149/1.1387238 URL
[76]	Xin X, Ito K, Dutta A, Kubo Y. Dendrite-free epitaxial growth of lithium metal during charging in Li-O₂ batteries[J]. Angew. Chem. Int. Ed., 2018, 57(40): 13206-13210. doi: 10.1002/anie.201808154 URL
[77]	Zheng J X, Zhao Q, Tang T, Yin J F, Quilty C D, Renderos G D, Liu X T, Deng Y, Wang L, Bock D C, Jaye C, Zhang D H, Takeuchi E S, Takeuchi K J, Marschilok A C, Archer L A. Reversible epitaxial electrodeposition of metals in battery anodes[J]. Science, 2019, 366(6465): 645-648. doi: 10.1126/science.aax6873 URL
[78]	Zhang K, Yan Z H, Chen J. Electrodeposition accelerates metal-based batteries[J]. Joule, 2020, 4(1): 10-11. doi: 10.1016/j.joule.2019.12.012 URL
[79]	Chappert C, Fert A, Van Dau F N. The emergence of spin electronics in data storage[J]. Nat. Mater., 2007, 6(11): 813-823. pmid: 17972936
[80]	Gundel A, Cagnon L, Gomes C, Morrone A, Schmidt J, Allongue P. In-situ magnetic measurements of electrodeposited ultrathin Co, Ni and Fe/Au(111) layers[J]. Phys. Chem. Chem. Phys., 2001, 3(16): 3330-3335. doi: 10.1039/b100547m URL
[81]	Di N, Damian A, Maroun F, Allongue P. Influence of potential on the electrodeposition of Co on Au(111) by in situ STM and reflectivity measurements[J]. J. Electro-chem. Soc., 2016, 163(12): D3062-D3068. doi: 10.1149/2.0091612jes URL
[82]	Cagnon L, Gundel A, Devolder T, Morrone A, Chappert C, Schmidt J E, Allongue P. Anion effect in Co/Au(111) electrodeposition: Structure and magnetic behavior[J]. Appl. Surf. Sci., 2000, 164: 22-28. doi: 10.1016/S0169-4332(00)00330-5 URL
[83]	Jurca H F, Damian A, Gougaud C, Thiaudiere D, Cortes R, Maroun F, Allongue P. Epitaxial electrodeposition of Fe on Au(111): Structure, nucleation, and growth mechanisms[J]. J. Phys. Chem. C, 2016, 120(29): 16080-16089. doi: 10.1021/acs.jpcc.5b12771 URL
[84]	Borges J G, Prod′homme P, Maroun F, Cortes R, Geshev J, Schmidt J E, Allongue P. Perpendicular anisotropy in electrodeposited Au/Co films[J]. Phys. B: Condensed Matter, 2006, 384(1-2): 138-140. doi: 10.1016/j.physb.2006.05.174 URL
[85]	He Z, Gudavarthy R V, Koza J A, Switzer J A. Room-temperature electrochemical reduction of epitaxial magnetite films to epitaxial iron films[J]. J. Am. Chem. Soc., 2011, 133(32): 12358-12361. doi: 10.1021/ja203975z URL
[86]	He Z, Koza J A, Liu Y C, Chen Q Z, Switzer J A. Room-temperature electrochemical reduction of epitaxial Bi₂O₃ films to epitaxial Bi films[J]. RSC Adv., 2016, 6(99): 96832-96836. doi: 10.1039/C6RA18098A URL
[87]	Chen L C, Dong J W, Schultz B D, Palmstrom C J, Berezovsky J, Isakovic A, Crowell P A, Tabat N. Epitaxial ferromagnetic metal/GaAs(100) heterostructures[J]. J. Vac. Sci. Technol. B, 2000, 18(4): 2057-2062. doi: 10.1116/1.1306297 URL
[88]	Bao Z L, Kavanagh K L. Epitaxial Fe/GaAs via electrochemistry[J]. J. Appl. Phys., 2005, 98(6): 066103. doi: 10.1063/1.2014939 URL
[89]	Norton D P. Synthesis and properties of epitaxial electronic oxide thin-film materials[J]. Mater. Sci. Eng. R Rep., 2004, 43(5-6): 139-247. doi: 10.1016/j.mser.2003.12.002 URL
[90]	Pauporte T, Lincot D. Heteroepitaxial electrodeposition of zinc oxide films on gallium nitride[J]. Appl. Phys. Lett., 1999, 75(24): 3817-3819. doi: 10.1063/1.125466 URL
[91]	Pauporte T, Lincot D. Electrodeposition of semiconductors for optoelectronic devices: results on zinc oxide[J]. Electrochim. Acta, 2000, 45(20): 3345-3353. doi: 10.1016/S0013-4686(00)00405-9 URL
[92]	Richardson T J, Slack J L, Rubin M D. Electrochromism in copper oxide thin films[J]. Electrochim. Acta, 2001, 46 (13-14): 2281-2284. doi: 10.1016/S0013-4686(01)00397-8 URL
[93]	Switzer J A, Kothari H M, Poizot P, Nakanishi S, Bohannan E W. Enantiospecific electrodeposition of a chiral catalyst[J]. Nature, 2003, 425(6957): 490-493. doi: 10.1038/nature01990 URL
[94]	Bohannan E W, Nicic I M, Kothari H A, Switzer J A. Enantiospecific electrodeposition of chiral CuO films on Cu(110) from aqueous Cu(II) tartrate and amino acid complexes[J]. Electrochim. Acta, 2007, 53(1): 155-160. doi: 10.1016/j.electacta.2007.01.040 URL
[95]	Kothari H M, Kulp E A, Boonsalee S, Nikiforov M P, Bohannan E W, Poizot P, Nakanishi S, Switzer J A. Enantiospecific electrodeposition of chiral CuO Films from copper(II) complexes of tartaric and amino acids on single-crystal Au(001)[J]. Chem. Mater., 2004, 16(22): 4232-4244. doi: 10.1021/cm048939x URL
[96]	Gudavarthy R V, Burla N, Kulp E A, Limmer S J, Sinn E, Switzer J A. Epitaxial electrodeposition of chiral CuO films from copper(II) complexes of malic acid on Cu(111) and Cu(110) single crystals[J]. J. Mater. Chem., 2011, 21(17): 6209-6216. doi: 10.1039/c0jm03423a URL
[97]	Brandt I S, Tumelero M A, Pelegrini S, Zangari G, Pasa A A. Electrodeposition of Cu₂O: Growth, properties, and applications[J]. J. Solid State Electrochem., 2017, 21(7): 1999-2020. doi: 10.1007/s10008-017-3660-x URL
[98]	Oba F, Ernst F, Yu Y S, Liu R, Kothari M, Switzer J A. Epitaxial growth of cuprous oxide electrodeposited onto semiconductor and metal substrates[J]. J. Am. Ceram. Soc., 2005, 88(2): 253-270. doi: 10.1111/j.1551-2916.2005.00118.x URL
[99]	Wee S H, Huang P S, Lee J K, Goyal A. Heteroepitaxial Cu₂O thin film solar cell on metallic substrates[J]. Sci. Rep., 2015, 5: 16272. doi: 10.1038/srep16272 URL
[100]	Switzer J A, Gudavarthy R V, Kulp E A, Mu G J, He Z, Wessel A J. Resistance switching in electrodeposited magnetite superlattices[J]. J. Am. Chem. Soc., 2010, 132(4): 1258-1260. doi: 10.1021/ja909295y pmid: 20055488
[101]	Grunberg P A. Nobel Lecture: From spin waves to giant magnetoresistance and beyond[J]. Rev. Mod. Phys., 2008, 80(4): 1531-1540. doi: 10.1103/RevModPhys.80.1531 URL
[102]	Switzer J A, Shane M J, Phillips R J. Electrodeposited ceramic superlattices[J]. Science, 1990, 247(4941): 444-446. pmid: 17788610
[103]	Spanger B, Schiessl U, Lambrecht A, Böttner H, Tacke M. Near-room-temperature operation of Pb_1-_xSr_xSe infrared diode lasers using molecular beam epitaxy growth techniques[J]. Appl. Phys. Lett., 1988, 53(26): 2582-2583. doi: 10.1063/1.100208 URL
[104]	Johnson T H. Lead salt detectors and arrays: PbS and PbSe[J]. P. Soc. Photo-Opt. Inst., 1984(443): 60-94.
[105]	Vertegel A A, Shumsky M G, Switzer J A. Epitaxial electrodeposition of lead sulfide on (100)-oriented single-crystal gold[J]. Angew. Chem. Int. Ed., 1999, 38(21): 3169-3171. pmid: 10556891
[106]	Beaunier L, Cachet H, Froment M. Epitaxial electrodeposition of lead selenide films on indium phosphide single crystals[J]. Mater. Sci. Semicond. Process., 2001, 4(5): 433-436. doi: 10.1016/S1369-8001(01)00008-7 URL
[107]	Beaunier L, Cachet H, Cortes R, Froment M. Epitaxial electrodeposition of lead telluride films on indium phosphide single crystals[J]. J. Electroanal. Chem., 2002, 532(1-2): 215-218. doi: 10.1016/S0022-0728(02)00758-1 URL
[108]	Boonsalee S, Gudavarthy R V, Bohannan E W, Switzer J A. Epitaxial electrodeposition of tin(II) sulfide nano-disks on single-crystal Au(100)[J]. Chem. Mater., 2008, 20(18): 5737-5742. doi: 10.1021/cm801502m URL
[109]	Brownson J R S, Georges C, Larramona G, Jacob A, De-latouche B, Lévy-Clément C. Chemistry of tin monosulfide (δ-SnS) electrodeposition: Effects of pH and temperature with tartaric acid[J]. J. Electrochem. Soc., 2008, 155(1): D40-D46. doi: 10.1149/1.2801867 URL
[110]	Shi D, Adinolfi V, Comin R, Yuan M J, Alarousu E, Buin A, Chen Y, Hoogland S, Rothenberger A, Katsiev K, Losovyj Y, Zhang X, Dowben P A, Mohammed O F, Sargent E H, Bakr O M. Low trap-state density and long carrier diffusion in organolead trihalide perovskite single crystals[J]. Science, 2015, 347(6221): 519-522. doi: 10.1126/science.aaa2725 URL
[111]	Dong Q F, Fang Y J, Shao Y C, Mulligan P, Qiu J, Cao L, Huang J S. Electron-hole diffusion lengths > 175 μm in solution-grown CH₃NH₃PbI₃ single crystals[J]. Science, 2015, 347(6225): 967-970. doi: 10.1126/science.aaa5760 URL
[112]	Banik A, Tubbesing J Z, Luo B, Zhang X T, Switzer J A. Epitaxial electrodeposition of optically transparent hole-conducting CuI on n-Si(111)[J]. Chem. Mater., 2021, 33(9): 3220-3227. doi: 10.1021/acs.chemmater.1c00110 URL
[113]	Wijeyasinghe N, Eisner F, Tsetseris L, Lin Y H, Seitkhan A, Li J H, Yan F, Solomeshch O, Tessler N, Patsalas P, Anthopoulos T D. p-Doping of copper(I) thiocyanate (CuSCN) hole-transport layers for high-performance transistors and organic solar cells[J]. Adv. Funct. Mater., 2018, 28(31): 1802055.