硫酸盐体系三价铬沉积机理及镀层表征

doi:10.13208/j.electrochem.170441

电化学（中英文） ›› 2018, Vol. 24 ›› Issue (1): 20-27. doi: 10.13208/j.electrochem.170441

• 电镀与表面精饰近期研究专辑( 哈尔滨工业大学安茂忠教授主编) • 上一篇下一篇

硫酸盐体系三价铬沉积机理及镀层表征

闫慧，黄帅帅，杨防祖^*，田中群，周绍民

厦门大学化学化工学院, 固体表面物理化学国家重点实验室, 福建厦门 361005

收稿日期:2017-04-14 修回日期:2017-05-17 出版日期:2018-02-28 发布日期:2017-05-18
通讯作者: 杨防祖 E-mail:fzyang@xmu.edu.cn
基金资助:
国家自然科学基金项目（No. 21621091）资助

Deposition Mechanism and Coating Characterization for the Trivalent Chromium Electrodeposition in Sulphate Electrolyte

YAN Hui，HUANG Shuai-shuai，YANG Fang-zu^*，TIAN Zhong-qun， ZHOU Shao-min

State Key Laboratory of Physical Chemistry of Solid Surfaces, Department of Chemistry,College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, Fujian, China

Received:2017-04-14 Revised:2017-05-17 Published:2018-02-28 Online:2017-05-18
Contact: YANG Fang-zu E-mail:fzyang@xmu.edu.cn

摘要/Abstract

摘要：

在新研发的硫酸盐三价铬镀厚铬的镀液体系中, 运用线性扫描伏安法(LSV)和循环伏安法(CV)对三价铬在铜电极表面的电沉积过程进行研究, 并运用X射线荧光测厚仪、扫描电子显微镜(SEM)、X射线能量色散谱(EDS)、X射线衍射仪(XRD)、显微硬度计和Tafel曲线表征铬镀层厚度、形貌、组成、结构、显微硬度及在3.5wt% NaCl溶液中的耐蚀性. 结果表明, 在该体系中三价铬的沉积过程分两步进行(Cr³⁺ + e → Cr²⁺ , Cr²⁺ + 2e → Cr), 第一步得到1个电子, 受电化学过程和扩散过程共同控制, 第二步得到2个电子, 为扩散控制下的不可逆过程; 该镀层为瘤状纳米晶结构, 镀层中含有少量的铁元素(1.10 wt%), 显微硬度达到789.2 Hv, 镀层在3.5wt% NaCl溶液中的腐蚀电位(E_corr)为-0.29 V, 腐蚀电流密度(j_corr)为9.26×10^-5 A·dm^-2.

关键词: 三价铬, 硫酸盐, 厚铬, 电沉积, 机理, 镀层表征.

Abstract:

Linear sweep voltammetry (LSV) and cyclic voltammetry (CV) were used to study the electrodeposition mechanism of trivalent chromium on a copper electrode in the novel sulphate electrolyte for thick trivalent chromium plating. The thickness, morphology, composition, microhardness, and structure, as well as the corrosion resistance in 3.5wt% NaCl solution of the trivalent chromium coatings were investigated by X-ray fluorescence gage, scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), microhardness tester, X-ray diffraction (XRD) and Tafel curve measurements. The results showed that the electrodeposition of trivalent chromium involved two consecutive one electron reduction steps. The first step, Cr³⁺ + e → Cr²⁺,is controlled by the electrochemical reduction and diffusion processes, and the second step, Cr²⁺ + 2e → Cr, is an irreversible process under the diffusion control. The trivalent chromium coating exhibited nodular nanocrystalline structure and contained a small amount of iron (1.10wt%). The microhardness of the coating reached to 789.2 Hv. The corrosion potential (E_corr) and corrosion current density (j_corr) of the coating in 3.5wt% NaCl solution were determined to be -0.29 V and 9.26×10^-5 A·dm^-2, respectively.

Key words: Trivalent chromium, Sulphate, Hard chromium, Electrodeposition, Mechanism, Coating Characterization.

中图分类号:

O646

闫慧，黄帅帅，杨防祖，田中群，周绍民. 硫酸盐体系三价铬沉积机理及镀层表征[J]. 电化学（中英文）, 2018, 24(1): 20-27.

YAN Hui，HUANG Shuai-shuai，YANG Fang-zu，TIAN Zhong-qun， ZHOU Shao-min. Deposition Mechanism and Coating Characterization for the Trivalent Chromium Electrodeposition in Sulphate Electrolyte[J]. Journal of Electrochemistry, 2018, 24(1): 20-27.

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https://electrochem.xmu.edu.cn/CN/Y2018/V24/I1/20

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硫酸盐体系三价铬沉积机理及镀层表征

Deposition Mechanism and Coating Characterization for the Trivalent Chromium Electrodeposition in Sulphate Electrolyte

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