薄层电沉积的共轭溶解-沉积行为

电化学（中英文） ›› 2005, Vol. 11 ›› Issue (3): 308-313.

薄层电沉积的共轭溶解-沉积行为

孙斌,邹宪武,金准智

中原工学院材料与化学工程系,武汉大学物理科学与技术学院,武汉大学物理科学与技术学院河南郑州450007 ,湖北武汉430072 ,湖北武汉430072

收稿日期:2005-08-28 修回日期:2005-08-28 出版日期:2005-08-28 发布日期:2005-08-28

A Conjugate Dissolution / Deposition Behavior in Thin Layer Electrodeposition

SUN Bin~

(*, 1), ZOU Xian-wu~(2),JIN Zhun-zhi~(2)(1. Department of Materials and Chemical Engineering, Zhongyuan Institute of Technology, Zhengzhou 450007, China,2. School of Physics and Technology, Whuhan Uniiversity, Wuhan 430072,China

Received:2005-08-28 Revised:2005-08-28 Published:2005-08-28 Online:2005-08-28

摘要/Abstract

摘要： 在铅的薄层电沉积生长中,铅的枝晶沉积物由于氢气的扰动从阴极断裂.断裂的沉积物片段并非在薄层电解槽中保持不动,而是自发地朝阳极方向快速运动.研究表明,这种奇特的现象是由断裂沉积物两端发生的共轭溶解-沉积反应造成的.本文讨论了这种现象产生的机制.

关键词: 铅, 电沉积, 电溶解

Abstract: During the electrodeposition of lead, the dendrite deposit segregates from the cathode due to the disturbance of hydrogen gas. The segregated deposit could move toward the anode spontaneously rather than keep stationary. The studies show that this novel phenomenon was caused by the conjugate electrodissolution and electrodeposition reactions taking place at two ends of the isolated segment of the deposit. The mechanism inducing this phenomenon is suggested.

Key words: Lead, Electrodeposition, Electrodissolution

中图分类号:

O646

孙斌,邹宪武,金准智. 薄层电沉积的共轭溶解-沉积行为[J]. 电化学（中英文）, 2005, 11(3): 308-313.

SUN Bin~. A Conjugate Dissolution / Deposition Behavior in Thin Layer Electrodeposition[J]. Journal of Electrochemistry, 2005, 11(3): 308-313.

参考文献

[1]Zach M P,Ng K H,PennerR M.Molybdenumnanow ires by electrodeposition[J].Sc ience,2000,290:2 120~2 122. [2]Snyder G J,L im J R,Huang C K,et al.Thermoelectricm icrodevice fabricated by a MEMS-like electrochem i-cal process[J].Nature M aterials 2003,(2):528~530. [3]Che G L,Lakshm i B B,F isher E R,et al.Carbon nano-tubu le m embranes for electrochem ical energy storageand production[J].Nature,1998,393:346~348. [4]M arshall G,Mocskos E,Molina F V,et al.Buoyancyand electrically driven convection models in th in-layerelectrodeposition[J].Phy.Rev.E,2003,68:021 607. [5]X ie Y W,Chen T,Dong S J.Influence on the th in lay-er spectroelectrochem istry:d iffusion w ith in a th in lay-er cell[J].E lectroch im.Acta,1995,40:1 177~1 180. [6]W angM,Zhong S,Y in X B,et al.Spontaneous correla-tion of crystallograph ic orientations in crystallite ag-gregation[J].Phys.Rev.Lett.,2001,86:3 827~3 829. [7]Futerko P,Hsing I M.Two-d im ensional fin ite-elem entm ethod study of the resistance of m embranes in poly-m er electrolyte fuel cells[J].E lectroch im.Acta,2000,45:1 741~1 747. [8]M accallum J R,V incent C A.Polym er E lectrolyte Re-views 1[M].London:E lsevier,1987. [9]C.A.V incentw ith F.Bon ino,M.lazzari and B.Scro-sati,Modern Batteries[M].London:Edward Arnold,1984. [10]Chen Ti-xian,Experim ental E lectrochem istry[M].X iam en:X iam en Un iversity press,1993. [11]Sun B(孙斌),Zou X(邹宪武),Jin Z Z(金准智).Morphological evolution in the electrodeposition of thePb-Sn b inary system[J].Physics Review E,2004,69:067202. [12]Lee J K,Shem ilt LW,Chun H S.Stud ies of b ipolarityin flu id ized bed electrodes[J].J.App l.E lectro-chem.,1989,19:877~882. [13]B rad ley J C,Chen H M,Crawford.J,et al..Creatingelectrical contacts between m etal partic les using d i-rected electrochem ical growth[J].Nature,1997,389:268~270. [14]Zhou Shao-m in(周绍民).M etal E lectrodeposition-theroy and Study M ethods[M].Shanghai:ShanghaiSc ientific and Technological Press,1989. [15]Kusakabe K,K imura T,Morooka S,et al.Rec ircu lat-ing feed operation of b ipolar packed-bed and trikle-bed electrode cells equ ipped w ith m esh spacers[J].J.App l.E lectrochem.,1987,17:724~729. [16]Sm ithells C J.M etal Reference Book,5 th ed[M].London:Butterworths,1976. [17]Zhang Ting-fang,Lu Jia-xing.E lectrolyte Solution[M].Shanghai:Shanghai Sc ientific and Technologi-cal L iterature Press,1991. [18]Gonzalez G.,M arshall G.,Molina F,et al.Three-d i-m ensional nature of ion transport in th in-layer electro-deposition[J].Phys.Rev.E,2002,65:051 607.