薄层电沉积的共轭溶解-沉积行为

电化学（中英文） ›› 2005, Vol. 11 ›› Issue (3): 308-313.

薄层电沉积的共轭溶解-沉积行为

孙斌,邹宪武,金准智

中原工学院材料与化学工程系,武汉大学物理科学与技术学院,武汉大学物理科学与技术学院河南郑州450007 ,湖北武汉430072 ,湖北武汉430072

收稿日期:2005-08-28 修回日期:2005-08-28 出版日期:2005-08-28 发布日期:2005-08-28

A Conjugate Dissolution / Deposition Behavior in Thin Layer Electrodeposition

SUN Bin~

(*, 1), ZOU Xian-wu~(2),JIN Zhun-zhi~(2)(1. Department of Materials and Chemical Engineering, Zhongyuan Institute of Technology, Zhengzhou 450007, China,2. School of Physics and Technology, Whuhan Uniiversity, Wuhan 430072,China

Received:2005-08-28 Revised:2005-08-28 Published:2005-08-28 Online:2005-08-28

摘要/Abstract

摘要： 在铅的薄层电沉积生长中,铅的枝晶沉积物由于氢气的扰动从阴极断裂.断裂的沉积物片段并非在薄层电解槽中保持不动,而是自发地朝阳极方向快速运动.研究表明,这种奇特的现象是由断裂沉积物两端发生的共轭溶解-沉积反应造成的.本文讨论了这种现象产生的机制.

关键词: 铅, 电沉积, 电溶解

Abstract: During the electrodeposition of lead, the dendrite deposit segregates from the cathode due to the disturbance of hydrogen gas. The segregated deposit could move toward the anode spontaneously rather than keep stationary. The studies show that this novel phenomenon was caused by the conjugate electrodissolution and electrodeposition reactions taking place at two ends of the isolated segment of the deposit. The mechanism inducing this phenomenon is suggested.

Key words: Lead, Electrodeposition, Electrodissolution

中图分类号:

O646

孙斌,邹宪武,金准智. 薄层电沉积的共轭溶解-沉积行为[J]. 电化学（中英文）, 2005, 11(3): 308-313.

SUN Bin~. A Conjugate Dissolution / Deposition Behavior in Thin Layer Electrodeposition[J]. Journal of Electrochemistry, 2005, 11(3): 308-313.

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链接本文: https://electrochem.xmu.edu.cn/CN/

https://electrochem.xmu.edu.cn/CN/Y2005/V11/I3/308

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