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电化学(中英文) ›› 2000, Vol. 6 ›› Issue (2): 169-174. 

• 研究论文 • 上一篇    下一篇

镍钨硼合金电沉积机理及镀层微晶尺寸

杨防祖,曹刚敏,胡筱,许书楷,周绍民   

  1. 厦门大学化学系固体表面物理化学国家重点实验室!物理化学研究所,福建厦门361005,厦门大学化学系固体表面物理化学国家重点实验室!物理化学研究所,福建厦门361005,厦门大学化学系固体表面物理化学国家重点实验室!物理化学研究所,福建厦门361005,厦门大学化学系固体表面物理化学
  • 收稿日期:2000-05-28 修回日期:2000-05-28 出版日期:2000-05-28 发布日期:2000-05-28

Electrocrystallization Mechanism and Grain Sizes of Ni-W-B Alloy Eletrodeposits

YANG Fang_zu *, CAO Gang_min, HU Xiao, XU Shu_kai, ZHOU Shao_min   

  1. (Chem. Dept., State Key Lab. For the Phys. Chem. of the Solid Surf., Insti. Phys. Chem.,Xiamen Univ., Xiamen 361005, China
  • Received:2000-05-28 Revised:2000-05-28 Published:2000-05-28 Online:2000-05-28

摘要: 应用循环伏安、恒电位阶跃和X射线衍射 (XRD)等方法研究了Ni_W_B合金电沉积特点和镀层微晶尺寸 .结果表明 ,在以柠檬酸铵为络合剂的溶液中 ,Ni_W_B合金沉积层较Ni_W合金有较低的电化学活性 .电位阶跃i~t曲线分析表明 ,在玻碳电极上Ni_W_B合金电结晶过程遵循扩散控制瞬时成核三维成长模式 ,且随过电位的增加 ,电极表面晶核数增多 .XRD测试结果表明 ,随沉积电流密度提高 ,合金镀层微晶尺寸逐渐增大 ,说明电流密度提高将更加有利于Ni_W_B合金电结晶过程中的晶核生长 .

关键词: Ni-W-B合金, 电沉积, 成核机理, 晶粒尺寸

Abstract: The electrodeposition characteristics and grain sizes of Ni_W_B alloy have been studied by cyclic voltammetry, potentiostatic step and X_ray diffraction (XRD). The results showed that Ni_W_B alloy electrodeposit obtained from the solution containing ammonium citrate as a complexing agent was presented in the lower electrochemical activity compared with Ni_W alloy. Based upon the i~t curves of potentiostatic step, it was revealed that electrocrystallization of Ni_W_B alloy on glassy carbon followed the mechanism of instantaneous nucleation and three dimensional growth with diffusion controlled. The crystal nucleus number on the surface of electrode was raised by the increase of overpotential. According to XRD experimental results, the grain sizes of the alloy deposits were gradually increased by the rising of deposition current densities, which elucidates that the increase of current density was more benefit to nucleus growing during the electrocrystallization of Ni_W_B alloy.

Key words: Ni_W_B alloy, Electrodeposition, Nucleation, Grain size

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