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电化学(中英文) ›› 1996, Vol. 2 ›› Issue (2): 164-169.  doi: 10.61558/2993-074X.3069

• 研究论文 • 上一篇    下一篇

铜在HOPG上电沉积过程的现场ECSTM研究

谢兆雄,毛秉伟,卓向东,穆纪,千田昭武   

  1. 厦门大学化学系
  • 收稿日期:1996-05-28 修回日期:1996-05-28 发布日期:1996-05-28 出版日期:1996-05-28

In Situ Studies of Copper Electrodepostion on HOPG by Using ECSTM

Xie Zhaoxiong Mao Bingwei Zhuo Xiangdong Mu Jiqian Tian Zhaowu   

  1. (State Key Laboratory for Physical Chemistry of the Solid Surfaces, Department of Chemistry, Xiamen University, Xiamen 361005
  • Received:1996-05-28 Revised:1996-05-28 Online:1996-05-28 Published:1996-05-28

关键词: ECSTM, STM, 电沉积, 铜沉积层

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