电沉积硅烷分子印迹膜修饰电极的制备及其应用

doi:10.61558/2993-074X.1877

电化学（中英文） ›› 2008, Vol. 14 ›› Issue (2): 130-134. doi: 10.61558/2993-074X.1877

电沉积硅烷分子印迹膜修饰电极的制备及其应用

王桂林;王荣;吴霞琴;章宗穰;

上海师范大学生命与环境科学学院化学系,上海师范大学生命与环境科学学院化学系,上海师范大学生命与环境科学学院化学系,上海师范大学生命与环境科学学院化学系上海200234,上海200234,上海200234,上海200234

收稿日期:2008-05-28 修回日期:2008-05-28 出版日期:2008-05-28 发布日期:2008-05-28

Electrodeposition of Sol-gel Imprinted Films Modified Electrode and its Application for 3,4-Dihydroxybenzoic Acids Determination

WANG Gui-lin,WANG Rong,WU Xia-qin,ZHANG Zong-rang

(Department of Chemistry,Shanghai Normal University,Shanghai 200234,China

Received:2008-05-28 Revised:2008-05-28 Published:2008-05-28 Online:2008-05-28

摘要/Abstract

摘要： 以3,4-二羟基苯甲酸作模板分子,在玻碳电极表面恒电位沉积四甲氧基硅烷和苯基三甲氧基硅烷,经无水乙醇将模板分子洗脱,制得硅溶胶-凝胶分子印迹膜电极.该电极能有效地抑制电化学氧化过程中3,4-二羟基苯甲酸的电聚合及其同分异构体2,4-二羟基苯甲酸对测定的干扰.实验表明,该修饰电极对3,4-二羟基苯甲酸测定的线性浓度范围为1.0×10-5~8.0×10-4mol.L-1,浓度检测下限为5.0×10-6mol.L-1.

关键词: 3,4-二羟基苯甲酸, 2,4-二羟基苯甲酸, 分子印迹技术, 硅溶胶-凝胶分子印迹膜, 修饰电极

Abstract: The sol-gel molecularly imprinted films modified glassy carbon electrode was prepared by electrodeposition of tetramethoxysilane(TMOS) and phenyltrimethoxysilane(PTMOS) with chronoamperometry in the presence of template molecules 3,4-dihydroxybenzoic acid(3,4-DHBA) followed by extraction with ethanol.The modified electrode could successfully avoid the polymerization of oxidized 3,4-DHBA and the interference of 2,4-DHBA.A linear concentration response curve was obtained from 1.0 × 10-5 mol·L-1 to 8.0×10-4 mol·L-1,with the detected concentration limit of 5.0 × 10-6 mol·L-1.

Key words: 3,4-dihydroxybenzoic acid, 2,4-dihydroxybenzoic acid, molecular imprinted technique, silica sol-gel molecular imprinted films, modified electrode

中图分类号:

O657.1

王桂林, 王荣, 吴霞琴, 章宗穰, . 电沉积硅烷分子印迹膜修饰电极的制备及其应用[J]. 电化学（中英文）, 2008, 14(2): 130-134.

WANG Gui-lin, WANG Rong, WU Xia-qin, ZHANG Zong-rang. Electrodeposition of Sol-gel Imprinted Films Modified Electrode and its Application for 3,4-Dihydroxybenzoic Acids Determination[J]. Journal of Electrochemistry, 2008, 14(2): 130-134.

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链接本文: https://electrochem.xmu.edu.cn/CN/10.61558/2993-074X.1877

https://electrochem.xmu.edu.cn/CN/Y2008/V14/I2/130

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电沉积硅烷分子印迹膜修饰电极的制备及其应用

Electrodeposition of Sol-gel Imprinted Films Modified Electrode and its Application for 3,4-Dihydroxybenzoic Acids Determination

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