卤离子溶液中邻香兰素邻苯二胺对铜的缓蚀作用

电化学（中英文） ›› 2000, Vol. 6 ›› Issue (1): 31-39.

卤离子溶液中邻香兰素邻苯二胺对铜的缓蚀作用

马厚义,陈慎豪,全贞兰,牛林,李淑兰

山东大学化学学院!山东济南25100,山东大学化学学院!山东济南25100,山东大学化学学院!山东济南25100,山东大学化学学院!山东济南25100,山东大学化学学院!山东济南25100

收稿日期:2000-02-28 修回日期:2000-02-28 出版日期:2000-02-28 发布日期:2000-02-28

Inhibition of N,N'-o-phenylen-bis(3-methoxysalicylidenimine) on Copper in Halide Solutions

MA Hou_yi ,CHEN Shen_hao,QUAN Zhen_lan,NIU Lin,LI Shu_lan

(College of Chemistry,Shandong University,Jinan 250100 China

Received:2000-02-28 Revised:2000-02-28 Published:2000-02-28 Online:2000-02-28

摘要/Abstract

摘要： 应用恒电位稳态极化和交流阻抗技术研究了希夫碱—邻香兰素邻苯二胺 (V_oPh_V)在中性NaCl或NaBr溶液中对金属铜阳极溶解和腐蚀的缓蚀作用 .通过比较铜在空白溶液与含有V_o_Ph_V溶液中的电化学行为解释了V_o_Ph_V的缓蚀机制 .此外还研究了V_o_Ph_V自组装膜在Na Cl溶液中对铜腐蚀的缓蚀效应 .

关键词: 邻香兰素邻苯二胺, 交流阻抗, 自组装膜, 缓蚀

Abstract: Inhibition of N,N'_o_phenylen_bis(3_methoxysalicylidenimine)(V_o_Ph_V)on corrosion and anodic disslution of copper in neutral NaCl and NaBr solutions was investigated in terms of potentiostatic steady_state polarization and A.C. impedance techniques.The inhibition mechanism of V_o_Ph_V to copper corrosion was interpreted in detail by comparing the electrochemical behaviors of copper in halide solutions with or without V_o_Ph_V. Besides,the inhibition effect of self_assembled V_o_Ph_V film on copper corrosion in NaCl was also studied.

中图分类号:

TG174.4

马厚义, 陈慎豪, 全贞兰, 牛林, 李淑兰. 卤离子溶液中邻香兰素邻苯二胺对铜的缓蚀作用[J]. 电化学（中英文）, 2000, 6(1): 31-39.

MA Hou_yi , CHEN Shen_hao, QUAN Zhen_lan, NIU Lin, LI Shu_lan . Inhibition of N,N'-o-phenylen-bis(3-methoxysalicylidenimine) on Copper in Halide Solutions[J]. Journal of Electrochemistry, 2000, 6(1): 31-39.

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链接本文: https://electrochem.xmu.edu.cn/CN/

https://electrochem.xmu.edu.cn/CN/Y2000/V6/I1/31

参考文献

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