卤离子对化学沉积镍的影响
Effect of Halide Ions on the Deposition of Electroless Nickel
Received date: 1996-05-28
Revised date: 1996-05-28
Online published: 1996-05-28
韩克平 . 卤离子对化学沉积镍的影响[J]. 电化学, 1996 , 2(2) : 198 -201 . DOI: 10.61558/2993-074X.3075
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