应用射频磁控溅射技术在硅基底上制备氧化锡薄膜,着重研究溅射功率对薄膜结构和电化学性能的影响.XRD,SEM分析及恒电流充放电测试表明,随着溅射功率的增大,薄膜的结晶程度提高;生长速率和晶粒尺寸增大;电池的贮锂容量减少,且首圈不可逆容量损失增大.溅射功率对薄膜的电化学性能有较大的影响.
蔡敏真
,
宋杰
,
吴启辉
,
郑明森
,
吴孙桃
,
董全峰
. 溅射功率对氧化锡薄膜结构和电化学性能的影响[J]. 电化学, 2008
, 14(1)
: 66
-70
.
DOI: 10.61558/2993-074X.1865
Tin oxide films were deposited on silicon substrates at room temperature using the radio frequency(RF) magnetron sputtering with different sputtering power.The influence of sputtering power upon the crystal structure,surface morphology and electrochemical properties of tin oxide films were then investigated.The XRD and SEM results illustrate that the phase of tin oxide thin films changed from amorphous to crystalline and the grain size augments with the increase of the sputtering power.The constant current charge and discharge cycle tests imply that the initial irreversible capacity loss of Li/tin oxide batteries increase and which capacity decrease as the sputtering power increases.The sputtering power has a great influence upon the structural and electrochemical properties of tin oxide films.
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