欢迎访问《电化学(中英文)》期刊官方网站,今天是
研究论文

亚硫酸盐无氰电沉积金新工艺及机制

  • 杨家强 ,
  • 金磊 ,
  • 李威青 ,
  • 王赵云 ,
  • 杨防祖 ,
  • 詹东平 ,
  • 田中群
展开
  • 厦门大学化学化工学院, 固体表面物理化学国家重点实验室,福建 厦门 361005

收稿日期: 2022-01-07

  修回日期: 2022-03-01

  网络出版日期: 2022-03-17

Electrodeposition Mechanism and Process of a Novel Cyanide-Free Gold Sulfite Bath

  • Jia-Qiang Yang ,
  • Lei Jin ,
  • Wei-Qing Li ,
  • Zhao-Yun Wang ,
  • Fang-Zu Yang ,
  • Dong-Ping Zhan ,
  • Zhong-Qun Tian
Expand
  • College of Chemistry and Chemical Engineering, State Key Laboratory of Physical Chemistry of Solid Surfaces, Xiamen University, Xiamen, 361005, China
* Yang Fang-Zu: Tel: (86-592)2185957, E-mail: fzyang@xmu.edu.cn,
Zhan Dong-Ping: Tel: (86-592)2181906, E-mail: dpzhan@xmu.edu.cn.

Received date: 2022-01-07

  Revised date: 2022-03-01

  Online published: 2022-03-17

摘要

直接以氯金酸作为主盐、 羟基乙叉二膦酸(HEDP)作为镀液稳定剂和镀层细化剂、 结合添加剂, 组成亚硫酸盐无氰镀金新工艺; 研究镀液稳定性、 镀层形态及金电沉积机制。结果表明, HEDP可明显提升镀液稳定性;不含HEDP的亚硫酸盐镀金液中, 镀层呈棒状晶粒并随沉积时间延长而逐渐生长,导致镀层外观随镀层厚度增加由金黄色转变为红棕色。镀液含有HEDP时, 金晶粒形态由棒状转变为棱锥状, 且棱锥状晶粒随沉积时间延长生长速率较小, 镀层厚度为1 μm时仍呈现金外观。电化学实验表明金电沉积不经历成核过程。

本文引用格式

杨家强 , 金磊 , 李威青 , 王赵云 , 杨防祖 , 詹东平 , 田中群 . 亚硫酸盐无氰电沉积金新工艺及机制[J]. 电化学, 2022 , 28(7) : 2213005 . DOI: 10.13208/j.electrochem.2213005

Abstract

A novel cyanide-free gold sulfite process is introduced in this paper. In the bath, chloauric acid was directly employed as the main salt, and hydroxyethylidene diphosphonic acid (HEDP) was used as the stabilizer and coating grain refiner. The bath stability, the gold coating morphology and the mechanism of gold electrodeposition were studied in detail. The results showed that HEDP could significantly improve the bath stability. Moreover, the grains of the gold coating obtained from the gold sulfite bath without HEDP was rod-like, which grew gradually with the increasing of the deposition time, resulting in that the appearance of the coating turned from a golden yellow to a hazy reddish brown by the increase of the coating thickness. As HEDP was introduced into the gold sulfite bath, the gold grains were transformed to pyramidal, and the grain growth rate accompanying the increase of the coating thickness was much slower than that in the gold sulfite bath without HEDP, observing the golden bright appearance within 1 μm thickness. Electrochemical curves indicated that gold electrodeposition did not undergo a nucleation stage.

参考文献

[1] Inoue K, Sasaki N, Sasahira T, Watanabe T, Nakata T. The relationship between microstructure and the thermal equilibrium diagram of Au-Co alloy electrodeposit[J]. Mater. Trans., 2006, 47(6): 1546-1549.
[2] Togasaki N, Okinaka Y, Homma T, Osaka T. Preparation and characterization of electroplated amorphous gold-nickel alloy film for electrical contact applications[J]. Electro-chim. Acta, 2005, 51(5): 882-887.
[3] Okinaka Y, Hoshino M. Some recent topics in gold plating for electronics applications[J]. Gold Bull., 1998, 31(1): 3-13.
[4] Kato M, Okinaka Y. Some recent developments in non-cy-anide gold plating for electronics applications[J]. Gold Bull., 2004, 37(1-2): 37-44.
[5] Hydes P C, Middleton H. The sulfito complexes of gold. Their chemistry and applications in gold electrodeposition[J]. Gold Bull., 1979, 12(3): 90-95.
[6] He A, Liu Q, Ivey D G. Electroplating of gold from a solution containing tri-ammonium citrate and sodium sulphite[J]. J. Mater. Sci.-Mater. Electron., 2009, 20(6): 543-550.
[7] Josell D, Moffat T P. Superfilling damascene trenches with gold in a sulfite electrolyte[J]. J. Electrochem. Soc., 2013, 160(12): D3009-D3014.
[8] Osaka T, Kodera A, Misato T, Homma T, Okinaka Y, Yoshioka O. Electrodeposition of soft gold from a thiosulfate-sulfite bath for electronics applications[J]. J. Electrochem. Soc., 1997, 144(10): 3462-3469.
[9] Estrine E C, Riemer S, Venkatasamy V, Stadler B J H, Tabakovic I. Mechanism and stability study of gold electrodeposition from thiosulfate-sulfite solution[J]. J. Electro-chem. Soc., 2014, 161(12): D687-D696.
[10] Jin L, Yang J Q, Yang F Z, Zhan D P, Wu D Y, Tian Z Q. Novel and green chemical compound of HAu(Cys)(2): Toward a simple and sustainable electrolyte recipe for yanide-free gold electrodeposition[J]. ACS Sustain. Chem. Eng., 2020, 8(38): 14274-14279.
[11] Yang X W, An M Z, Zhang Y W, Zhang L. Electrochemical behavior of gold (III) in cyanide-free bath with 5,5′-dimethylhydantoin as complexing agent[J]. Electrochim. Acta, 2011, 58: 516-522.
[12] Ren X F, An M Z. Theoretical and experimental studies of the influence of gold ions and dmh on cyanide-free gold electrodeposition[J]. RSC Adv., 2018, 8(5): 2667-2677.
[13] Chen J S, Fang Y M, Qiu Q Y, You L X, Song J, Zhang G M, Chen G N, Sun J J. Electrodeposition of bright gold - a green path using hypoxanthine as a complexing agent[J]. Green Chem., 2011, 13(9): 2339-2343.
[14] Huang W, Jiang J Z, Chen L, Zhang B Q, Deng S F, Sun J J, Chen W K. Density functional theory and surface enhanced Raman spectroscopy studies of tautomeric hypoxanthine and its adsorption behaviors in electrochemical processes[J]. Electrochim. Acta, 2015, 164: 132-138.
[15] Jin L, Yang J Q, Yang F Z, Wu D Y, Tian Z Q. Electrochemistry and coordination behaviors of hypoxanthine-Au (III) ion in the cyanide-free gold electrodeposition[J]. J. Electrochem. Soc., 2020, 167(2): 22511.
[16] Green T A. Gold electrodeposition for microelectronic, optoelectronic and microsystem applications[J]. Gold Bull., 2007, 40(2): 105-114.
[17] Osaka T, Kato N, Sato J, Yoshizawa K, Homma T, Okinaka Y, Yoshioka O. Mechanism of sulfur inclusion in soft gold electrodeposited from the thiosulfate-sulfite bath[J]. J. Electrochem. Soc., 2001, 148(10): C659-C662.
[18] Green T A, Liew M J, Roy S. Electrodeposition of gold from a thiosulfate-sulfite bath for microelectronic applications[J]. J. Electrochem. Soc., 2003, 150(3): C104-C110.
[19] Yang J Q, Yu H H, Jin L, Yang F Z, Wu D Y, Zhan D P, Tian Z Q. Insights into the effects of chloride ions on cyanide-free gold electrodeposition[J]. J. Electrochem. Soc., 2020, 167(10): 102514.
[20] Yang J Q, Jin L, Xiao Y H, Yu H H, Yang F Z, Zhan D P, Wu D Y, Tian Z Q. Suppressing sulfite dimerization at a polarized gold electrode/water solution interface for high-quality gold electrodeposition[J]. Langmuir, 2021, 37(38): 11251-11259.
[21] Fang J L. Thoery and applications of electroplating addictives[M]. China: National Defense Industry Press, 2006.
[22] Shaw C F. Gold-based therapeutic agents[J]. Chem. Rev., 1999, 99(9): 2589-2600.
[23] Huang S S, Liu C, Jin L, Yang F Z, Tian Z Q. Complex coordination silver electrocrystallization mechanism on glassy carbon electrode surface[J]. J. Electrochem., 2018, 24(04): 344-350.
[24] Budevski E, Staikov G, Lorenz W J. Electrocrystallization nucleation and growth phenomena[J]. Electrochim. Acta, 2000, 45(15-16): 2559-2574.
[25] Scharifker B, Hills G. Theoretical and experimental studies of multiple nucleation[J]. Electrochim. Acta, 1983, 28(7): 879-889.
文章导航

/