通过改良的“Hummers方法”制得氧化石墨烯，利用聚二甲基硅氧烷（PDMS）弹性印章的微接触印刷技术，以Au膜和氧化石墨烯溶液为“墨水”，通过二次印章转移，分别将Au纳米粒子和氧化石墨烯（Graphene Oxide，GO）转移至修饰了(3-氨基丙基)三乙氧基硅烷（APTES）的ITO基底（APTES/ITO）表面. 利用场发射扫描电子显微镜（FE-SEM）、原子力显微镜（AFM）等表征图案，结果表明转移的AuNPs和GO组成的复合图案均匀，致密性较好. 利用表面电势显微镜（Surface Potential Microscope，SEPM，KFM）测定了各部分的表面电势，以APTES/ITO基底表面为表面电势零点，各部分表面电势大小为：APTES/ITO > GO > Au（0，-11.6，-44.2 mV）.
Graphene oxide (GO) was prepared by modified Hummers method. Using the GO solution as "ink", Au nanoparticles (AuNPs) and GO were transferred to the surface of ITO substrate modified with (3-aminopropyl) triethoxysilane (APTES/ITO) in a sequence. The transferred AuNPs and GO could form a uniform and dense composite pattern which was characterized by FE-SEM and AFM. Moreover, using the APTES/ITO substrate surface potential as zero, the sequences of the surface potential were APTES>GO>Au.
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