利用约束刻蚀剂层技术提高硅的刻蚀分辨率
祖延兵, 谢雷, 毛秉伟, 穆纪千, 谢兆雄, 田昭武, 孙立宁
Improved Etching Resolution on Silicon by the Confined Etchant Layer Technique
Zu Yanbing, Xie Lei, Mao Bingwei, Mu Jiqian, Xie Zhaoxiong, Tian Zhaowu, Sun Lining
电化学（中英文）
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1997, (1): 11
-14
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DOI: 10.61558/2993-074X.3554
