3D NAND制程中选择性刻蚀工艺的SiO2回沾问题研究进展
周紫晗, 吴蕴雯, 李明, 王溯
Research Progress of SiO2 Regrowth during Selective Etching Process in 3D NAND Manufacture Procedure
Zi-Han Zhou, Yun-Wen Wu, Ming Li, Su Wang
电化学（中英文）
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2021, (1): 26
-34
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DOI: 10.13208/j.electrochem.200610
