铜在HOPG上电沉积过程的现场ECSTM研究

1996 , Vol. 2 >Issue 2: 164 - 169

研究论文

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收稿日期: 1996-05-28

修回日期: 1996-05-28

网络出版日期: 1996-05-28

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In Situ Studies of Copper Electrodepostion on HOPG by Using ECSTM

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(State Key Laboratory for Physical Chemistry of the Solid Surfaces, Department of Chemistry, Xiamen University, Xiamen 361005

Received date: 1996-05-28

Revised date: 1996-05-28

Online published: 1996-05-28

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谢兆雄 . 铜在HOPG上电沉积过程的现场ECSTM研究[J]. 电化学, 1996 , 2(2) : 164 -169 . DOI: 10.61558/2993-074X.3069

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