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研究论文

铜在HOPG上电沉积过程的现场ECSTM研究

  • 谢兆雄
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  • 厦门大学化学系

收稿日期: 1996-05-28

  修回日期: 1996-05-28

  网络出版日期: 1996-05-28

In Situ Studies of Copper Electrodepostion on HOPG by Using ECSTM

  • Xie Zhaoxiong Mao Bingwei Zhuo Xiangdong Mu Jiqian Tian Zhaowu
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  • (State Key Laboratory for Physical Chemistry of the Solid Surfaces, Department of Chemistry, Xiamen University, Xiamen 361005

Received date: 1996-05-28

  Revised date: 1996-05-28

  Online published: 1996-05-28

本文引用格式

谢兆雄 . 铜在HOPG上电沉积过程的现场ECSTM研究[J]. 电化学, 1996 , 2(2) : 164 -169 . DOI: 10.61558/2993-074X.3069

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