电沉积铜钴纳米多层膜的机理研究

1997 , Vol. 3 >Issue 4: 401 - 407

研究论文

电沉积铜钴纳米多层膜的机理研究

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收稿日期: 1997-11-28

修回日期: 1997-11-28

网络出版日期: 1997-11-28

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Mechanism of Electrodeposition of Cu/Co Multilayer Thin Films

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(Department of Surface Science and Corrosion Engineering University of Science and Technology, Beijing, Beijing 100083)

Received date: 1997-11-28

Revised date: 1997-11-28

Online published: 1997-11-28

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薛江云 . 电沉积铜钴纳米多层膜的机理研究[J]. 电化学, 1997 , 3(4) : 401 -407 . DOI: 10.61558/2993-074X.2663

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