欢迎访问《电化学(中英文)》期刊官方网站,今天是
研究论文

金在微电极上的电沉积研究

  • 熊丽华
展开
  • 江西师范大学化学系,厦门大学固体表面物理化学国家重点实验室

收稿日期: 1998-02-28

  修回日期: 1998-02-28

  网络出版日期: 1998-02-28

Gold Electrodeposition on Microelectrodes

  • Xiong Lihua
Expand
  • (Dept. of Chem., Jiangxi Normal Univ., Nanchang 330027)Shi Caihui Li Xiaoqni Mao Beigwei*(State Kay Lab. for Phy. Chem. of Solid Suface, Inst. of Phy. Chem., Chem. Dept., Xiamen Univ., Xiamen 361005)

Received date: 1998-02-28

  Revised date: 1998-02-28

  Online published: 1998-02-28

摘要

本工作利用循环伏安法和阶跃电位法研究在AuCl3的酸性溶液中金在玻碳和铂微电极上的电沉积行为.结果表明,金在微电极上成核所需的过电位较高,但成核几率也高,在所研究的微电极尺寸范围内,金可形成大量的临界单核,且核的生长速率很快.铂微电极上金电沉积的Ⅰ-t曲线符合连续成核的模式.玻碳微电极的沉积历史对金的电沉积行为的影响较大,可以加速金的成核和生长,而铂却没有这种影响.

关键词: ; 电沉积; 微电极; 玻碳;

本文引用格式

熊丽华 . 金在微电极上的电沉积研究[J]. 电化学, 1998 , 4(1) : 25 -29 . DOI: 10.61558/2993-074X.2673

Abstract

The initial stage electrodeposition behaviors of gold onto glassy carbon and platinum microelectrodes are studied in an acid solution containing AuCl_3using cyclic voltammetry and potential step techniques. The results suggest that gold nucleation on microelectrodes requires a higher driving force with high probability. Within the range of the microelectrode dimension that have been used in the present work, large amount of gold nucleus could be formed at short time scale at overpotentials higher than a threshole value. The It curves from the platinum microelectrode are in consistence with the continuous nucleation model. It has been found that the deosition history of the glassy carbon microelectrode substrate has strong influences on subsequent electrodeposition behavior while the platinum microelectrode does not show such effects.

参考文献

1BWMao,LHXiong,XWCai.ExperimentalstrategiesforcontinuousmeasurementsofI-ttransientsofasilversinglenucleusoncarbonmicroelectrodes.J.Electroanal.Chem.,1996,416:145~1502B.W.Mao,L.H.Xiong,B.Ren,X.Q.Li.Apotential-pulseinterferencemethodforstudiesofthenucle-ationofasinglesilvercentreoncarbonmicroelectrodes.J.Chem.Soc.,FaradayTrans.,1996,92:2389~23923MJPena,RCeldran,RDuo.Electrodepositionstudyonultramicroelectrodes.PartⅠ.InfluenceofthesubstratesurfacestateinAgcrystalization.J.Electroanal.Chem.,1994,367:85~924YCGuan,KNHan.Theelectrochemicalstudyofthedepositionofgoldontocopperandzincinammoni-acalsolutions.J.Electrochem.Soc.,1995,142:1139~11445GaminiGunawardena,GrahanHils,ireneMontenegro.Electrochemicalnucleation.PartⅡ:Theelec-trodepositionofsilveronvitreouscarbon.J.Electroanal.Chem.,1982,138:241~2546周绍民著。《金属电沉积-原理与研究方法》。上海:上海科学技术出版社,1987:219
文章导航

/