硫脲及其衍生物对铜阴极电沉积影响的电化学研究
收稿日期: 1999-08-28
修回日期: 1999-08-28
网络出版日期: 1999-08-28
Influence of Thiourea and Its Derivate on the Process of Cathodic Electrodeposition of Copper
Received date: 1999-08-28
Revised date: 1999-08-28
Online published: 1999-08-28
董云会 . 硫脲及其衍生物对铜阴极电沉积影响的电化学研究[J]. 电化学, 1999 , 5(3) : 342 -345 . DOI: 10.61558/2993-074X.3195
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