研究了CS在铝阴极表面的电泳沉积行为和成膜机理 ,试验了槽压、CS浓度、溶液 pH值、温度、支持电解质品种等对成膜的影响 ,采用XRD、SEM等技术确证涂膜的生成 ,表征了膜层形貌 ,讨论CS电泳沉积的反应历程 .
The electrophoretic deposition behavior and the corresponding coating mechanism were investigated. The influencing factors, such as cell potential, CS concentration, pH value of solution, temperature and supporting electrolytes, on coating were researched. The coating morphology was characterized by XRD and SEM. The mechanism of electrophoretic deposition in CS solution was discussed.
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