两步法制备多孔硅及其表征I:恒电流法(英文)

2000 , Vol. 6 >Issue 4: 399 - 405

研究论文

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收稿日期: 2000-11-28

修回日期: 2000-11-28

网络出版日期: 2000-11-28

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Fabrications and Characterizations of Porous Silicon by Tow-step Techniques I:Constant Current Application

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(Department of Chemistry, ** Department of Materials Science State Key Laboratory for Physical Chemistry of Solid Surfaces *** Center for

Received date: 2000-11-28

Revised date: 2000-11-28

Online published: 2000-11-28

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程璇 , 刘峰名 , 林昌健 , 温作新 , 田中群 . 两步法制备多孔硅及其表征I:恒电流法(英文)[J]. 电化学, 2000 , 6(4) : 399 -405 . DOI: 10.61558/2993-074X.1401

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