铜在氨水介质铁氰化钾抛光液中CMP的电化学行为研究
收稿日期: 2001-11-28
修回日期: 2001-11-28
网络出版日期: 2001-11-28
Study on Electrochemical Behavior of Copper in NH_3·H_2O Solution Medium Including K_3 during CMP
Received date: 2001-11-28
Revised date: 2001-11-28
Online published: 2001-11-28
胡岳华 , 何捍卫 , 黄可龙 . 铜在氨水介质铁氰化钾抛光液中CMP的电化学行为研究[J]. 电化学, 2001 , 7(4) : 480 -486 . DOI: 10.61558/2993-074X.3271
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