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研究论文

硫脲对镍电沉积的作用

  • 胡光辉 ,
  • 吴辉煌 ,
  • 杨防祖 ,
  • 王森林
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  • 厦门大学化学化工学院固体表面物理化学国家重点实验室,厦门大学化学化工学院固体表面物理化学国家重点实验室,厦门大学化学化工学院固体表面物理化学国家重点实验室,厦门大学化学化工学院固体表面物理化学国家重点实验室 福建厦门361005 ,福建厦门361005 ,福建厦门361005 ,福建厦门361005

收稿日期: 2004-02-28

  修回日期: 2004-02-28

  网络出版日期: 2004-02-28

Effect of Thiourea on Nickel Deposition

  • HU Guang-hui ,
  • WU Hui-huang~ ,
  • YANG Fang-zu ,
  • WANG Sheng-lin ical Chemistry of Solid Surfaces
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Received date: 2004-02-28

  Revised date: 2004-02-28

  Online published: 2004-02-28

摘要

应用循环伏安和阻抗_电位法研究了硫脲(TU)对玻碳电极和镀镍玻碳电极上镍沉积过程的影响.结果表明,在玻碳电极上镍的电沉积呈现明显的电化学成核机理,而在镀镍玻碳电极上则无此特征.TU的存在虽阻碍了Ni晶核的形成,但却能加速晶粒的生长.

本文引用格式

胡光辉 , 吴辉煌 , 杨防祖 , 王森林 . 硫脲对镍电沉积的作用[J]. 电化学, 2004 , 10(1) : 94 -97 . DOI: 10.61558/2993-074X.1552

Abstract

Effect of thiourea on nickel deposition at glassy carbon and nickel-deposited glass carbon electrodes was investigated with cyclic voltammograms and impetance-potential curves. It was found that the nucleation processes occurred at the glassy carbon electrode. However, this characteristics disappeared at the nicked-deposited glassy carbon electrode. It was suggested that the presence of thiourea hindered the nucleation processes, yet accelerated grain growth.Curves of impetance-potential could sensitively detect effect of thiourea on nickel depositon and reflect changes in rate-determining step with potential.

参考文献

[1] Kwang_LungLin,Jia_WeiHwang.Effectofthioureaandleadacetateonthedepositionofelectrolessnickel[J].MaterialsChemistryandPhysics,2002,76:204~211. [2] ZhaQuanxing(查全性).KineticofElectrodeProgress(电极过程动力学)[M].Beijing:ScientificPublication,Press,(科学出版社,北京),2002.131. [3] SoutoRM,GonzalezS,ArevaloA.Ontheadsorptionofcadmium(II)ionsonaHMDEfromKF+thioureaaqueoussolutions[J].Electroanal.Chem.,1987,216:273~282 [4] SykutK,SabaJ,MarczewskaB.Daimata.TheinfluenceofthioureaontheelectroreductionofZn2+ionsinvarioussupportingelectrolytesinrespecttothecap_paireffect[J].Electroanal.Chem.,1984,178:295.
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