应用自组装技术在铜电极表面上制备3巯基丙基三甲氧基硅烷自组装膜.红外光谱研究该自组装膜结构,电化学方法考察3-巯基丙基三甲氧基硅烷膜在5%NaCl溶液中对铜电极的缓蚀性能.结果表明,于不同浓度的3-巯基丙基三甲氧基硅烷乙醇溶液中自组装的硅烷膜表现出较好的抗腐蚀性.
A self-assembled monolayer of (3-mercaptopropyl) trimethoxysilane(MPTS) was formed on a electrochemical polished copper surface electrode. The corrosion protection abilities of the monolayer were evaluated in 5% NaCl solution using electrochemical linear polarization. The effects of deposition time and silane concentration on corrosion of copper were also discussed. The surface structure of MPTS films was measured by FT-IR and SEM. It was found that the corrosion resistance of copper was reduced markedly owing to the MPTS monolayers formation on copper. The MPTS monolayer retarded the reduction of dissolved oxygen and inhibited the growth of copper oxide in the NaCl solution. FT-IR results indicated the linkages of siloxane on copper suraface. The presenceof (CH_(3)O)_(3)Si (CH_(2)) _(3)SHincreased the inhibition efficiency at every concentration.
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