以喷金云母片为基体,浓度为正常镀液5%的电镀镍液作母液,应用电化学扫描隧道显微镜在纳米尺度范围内在线原位观察光亮剂对镀层微观形貌的影响.实验发现,对不加光亮剂的镀液,所得镀层尽管无光亮性,但镀后的粗糙度与峰谷值HA-V明显降低;加有全光亮性光亮剂的镀液,虽可得到全光亮镀层,但其粗糙度与峰谷值HA-V却增加了,半光亮剂对峰谷值与光亮性的影响处于以上两者之间,证明光亮剂的作用机理不是微观整平作用,纳米尺度内的微观整平性与镀液的光亮性没有必然的联系.
In this work,the gold-plated mica was used for the substrate,the concentration of 5% of normal plating solution for the nickel was used as the mother solution,and the effect for the deposition by the brighter with ECSTM was in-situ detected.The solution for deposition without the brighter has no brightness,though the values of the roughness and the H_(A-V) have reduced in evidence after deposition;the solution for deposition with the complete brighter although has great brightness,the values of the roughness and the H_(A-V) have increased(after) deposition;the solution for deposition with the half brighter has a moderate effect on the H_(A-V) and (brightness).Hence,the brighter effect is not the micro-leveling effect,and the micro-leveling effect has no direct relation with the brightness.
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