微电极的制作是微流控芯片电化学检测的关键技术.本文提出CO2激光烧蚀结合化学腐蚀快速制作微流控芯片阵列微电极的方法.在溅射Au/Cr的玻璃基片上涂敷指甲油作牺牲层,利用CO2激光烧蚀开窗口,经化学腐蚀后获得阵列电极,电极宽度为100μm.考察了激光加工参数及牺牲层对电极加工质量的影响,对由键合包封制作的微流控芯片,循环伏安及流动注射分析测试表明,该电极芯片可用于微流控芯片的安培检测.
A rapid process is described to produce single or multiple electrodes of any shape based on CO_(2) laser ablation for microfluidic chip.The method is as follow: coating a kind of material as sacrifice layer on a piece of glass with sputtered Cr and Au;designing the needed pattern on a computer;selecting proper parameters and ablating with CO_(2) laser;wiping of Au/Cr and sacrifice layer,and obtain electrodes at last.The microfluidic chip was gotten by reversely bonding with a piece of PDMS,and sealing around with PDMS prepolymer.The mask' effect is the main factor that influencing electrode quality.The width of electrodes could be 100 μm.Demonstrated by voltammetry and flow injection amperometric analysis,the microfluidic chip could be used for amperometric detection.
[1]Reyes D R,Iossifid is D,Auroux P A,et al.M icro totalanalysis system s.1.Introduction,theory,and technol-ogy[J].Anal.Chem.,2002,74(12):2623.
[2]W ang J.E lectrochem ical detection for m icroscale ana-lytical system s:a review[J].Talanta,2002,56(2):223.
[3]Fang Zhao-lun(方肇伦).M icroflu id ic Analytical Ch ip[M].Be ijing:Sc iences Press,2003:286~296.
[4]M artin R S,Gawron A J,Lunte S M.Dual-electrodeelectrochem ical detection for poly(d im ethylsiloxane)-fabricated cap illary electrophoresis m icroch ips[J].Anal.Chem.,2000,72(14):3196.
[5]H ilm i A,Luong J H T.E lectrochem ical detectors pre-pared by electroless deposition for m icrofabricated elec-trophoresis ch ips[J].Anal.Chem.,2000,72(19):4677.
[6]Yan J L,Du Y,L iu J F,et al.Fabrication of integrat-ed m icroelectrodes for electrochem ical detection on elec-trophoresis m icroch ip by electroless deposition and m i-cromold ing in cap illary techn ique[J].Anal.Chem.,2003,75(20):5406.
[7]Chen Der-chang,Hsu Feng-liu,Zhan D ian-zhen,et al.Pallad ium film decoup ler for amperom etric detection inelectrophoresis ch ips[J].Anal.Chem.,2001,73(4):758.
[8]Angnes L,R ichter E M,AugelliM A,et al.Gold elec-trodes from recordab le CD s[J].Anal.Chem.,2000,72(21):5503.
[9]Dan iel D,Gutz I G R.Qu ick production of gold elec-trode sets or arrays and of m icroflu id ic flow cells basedon heat transfer of laser printed toner m asks onto com-pact d iscs[J].E lectrochem.Commn.,2003,5(9):782.
[10]Dan iel D,Gutz I G R.M icroflu id ic cells w ith inter-d igitated array gold electrodes:Fabrication and elec-trochem ical characterization[J].Talanta,2005,68(2):429.
[11]Haefliger D,Cah ill B P,Stemm er A.Rap id prototy-p ing of m icro-electrodes on glass and polym ers by la-ser-assisted corrosion of alum inum film s in water[J].M icroelectron ic Engineering.2003,67-68:473.
[12]Cheng Ji-yen,W e i Cheng-wey,Hsu Kai-hsiung,etal.D irectwrite laserm icrom ach in ing and un iversal sur-face mod ification of PMMA for device develop-m ent[J].Sens.Actuators B,2004,99:186.
