应用电化学方法在Ni基底上沉积Cu2O彩色膜层以期提高装饰效果.X光电子能谱(XPS)、扫描电子显微镜(SEM)和能量色散谱(EDS)测试表明,膜层由Cu2O组成,沉积层光滑平整,且Cu2O层均匀覆盖Ni基底.椭圆偏振光谱表征不同沉积时间的膜层,提出膜层内存在由Ni逐渐变为Cu2O的过渡层,建立"空气—Cu2O层—过渡层—Ni基底"4层膜模型,并借助梯度有效介质近似解析椭圆偏振光谱,得到不同沉积时间的膜层厚度以及厚度随时间线性增长关系.
封雪松
,
雷惊雷
,
陈爱祥
,
阴宛珊
,
李凌杰
,
郑莎
,
赵辉
,
潘少彦
. 镍基彩色电沉积Cu_2O椭圆偏振光谱研究[J]. 电化学, 2009
, 15(3)
: 310
-314
.
DOI: 10.61558/2993-074X.2001
The colored Cu2O coating was electroplated on Ni substrate to meet the decorative requirements. Results of X-ray photoelectron spectroscopy (XPS) indicate the coating consisting of Cu2O. Images of scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) show that the Cu2O coating is smooth and uniform,and covers the Ni substrate wholly. Ellipsomtric measurements for Cu2O coatings with various electroplating time were carried out. Using a 4-layer model of "Air-Cu2O layer-interphase-Ni" ,the interphase was modeled with the graded effective medium approximation (EMA),the ellipsomtric data were deconvoluted and the Cu2O coatings thickness of Cu2O was obtained. Results reveal that the Cu2O coating thickness increases linearly with the electroplating time.
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