电子功能外延薄膜的电沉积
收稿日期: 2022-02-28
修回日期: 2022-05-04
网络出版日期: 2022-05-12
Electrodeposition of Functional Epitaxial Films for Electronics
Received date: 2022-02-28
Revised date: 2022-05-04
Online published: 2022-05-12
电沉积作为一种在温和条件下从溶液中合成材料的技术已被广泛应用于在导体和半导体基底表面合成各种功能材料。电沉积一般由人为施加于基底的电刺激（如：施加电位/电流）来触发。这种电刺激通过氧化或还原靠近基底表面的溶液层内部的离子、 分子或配合物从而使该溶液层偏离其热力学平衡状态,随后引起目标产物在基底表面的沉积。在电沉积过程中, 许多实验参数都可能从不同的方面对沉积物的物化性质造成影响。迄今为止,已通过电沉积制备出多种单质（包括金属和非金属单质）、 化合物（例如：金属氧化物、金属氢氧化物、 金属硫化物等）以及复合材料。电沉积制备的这些材料大多为多晶、 织构或外延薄膜的形式。其中, 外延薄膜是一种具有特定的面外和面内晶体生长取向且其晶体取向受基底控制的类单晶薄膜。由于外延薄膜中高度有序的原子排列,它们常呈现出独特的电磁性质。本文总结了常见的电沉积合成路线及影响沉积物外延生长的关键实验因素。此外, 本文简要介绍了用于表征外延薄膜的技术。最后, 本文还讨论了一些采用电沉积制备的具有特殊电子、 电磁及光电特性的功能外延薄膜。
黄葵 , 黄容姣 , 刘素琴 , 何震 . 电子功能外延薄膜的电沉积[J]. 电化学, 2022 , 28(7) : 2213006 . DOI: 10.13208/j.electrochem.2213006
Electrodeposition is a solution-based synthesis technique that can be used to fabricate various functional materials on conductive or semiconductive substrates under ambient conditions. Electrodeposition is usually triggered by an artificial electric stimulation (i.e., applied potential/current) to the substrate to oxidize or reduce ions, molecules, or complexes in the deposition solution layer near the substrate surface, which drives this solution layer to depart from its thermodynamic equilibrium and consequently causes the assembly of targeted deposits on the substrate. During electrodeposition, many experimental parameters could affect the properties of the deposits in different ways. To date, many elements (both metals and nonmetals), compounds (e.g., metal oxides, hydroxides, and chalcogenides), and composites have been electrodeposited, mostly as either polycrystalline, textured, or epitaxial films. Among them, the epitaxial films are a kind of single-crystal-like films grown with certain out-of-plane and in-plane orientations. Due to the highly ordered atomic arrangement in epitaxial films, they usually exhibit unique electric and magnetic properties. In this review, the common synthetic routes for the electrodeposition as well as the key experimental parameters that affect the epitaxial growth of the deposits are summarized. Besides, techniques used to characterize epitaxial films are briefly introduced. Furthermore, the electrodeposited functional epitaxial films with special electronic, electromagnetic, and photovoltaic properties are discussed.
Key words： electrodeposit; electroplating; thin film; highly oriented
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