欢迎访问《电化学(中英文)》期刊官方网站,今天是
研究论文

共晶基离子液体的钴电化学沉积

  • M. Rostom Ali ,
  • S Sankar Saha ,
  • Md Ziaur Rahman
展开
  • 1. 孟加拉共和国拉杰沙希大学应用化学化工系;2. 孟加拉共和国拉杰沙希工程技术大学化学系学; 3. 孟加拉共和国苏尔拉赫曼学院

收稿日期: 2016-11-23

  修回日期: 2017-06-16

  网络出版日期: 2018-05-25

基金资助

The University of Rajshahi for financial support of this work (Grand Reference No. 712/5/52/RU/Eng-01/2013)

Electrodeposition of Cobalt from Eutectic-Based Ionic Liquid

  • M. Rostom Ali ,
  • S Sankar Saha ,
  • Md Ziaur Rahman
Expand
  • 1. Department of Applied Chemistry and Chemical Engineering, University of Rajshahi, Rajshahi-6205, Bangladesh; 2. Department of Chemistry, Rajshahi University of Engineering and Technology, Rajshahi-6204, Bangladesh; 3. Shamsur Rahman Model College, Faridpur, Pabna, Bangladesh

Received date: 2016-11-23

  Revised date: 2017-06-16

  Online published: 2018-05-25

Supported by

The University of Rajshahi for financial support of this work (Grand Reference No. 712/5/52/RU/Eng-01/2013)

摘要

通过恒电流和恒电位方法,研究了不同温度下脲-氯化胆硷(氯仿)基或乙二醇-氯化胆硷(氯仿)基离子液体中氯化钴溶液在铜和钢阴极上的钴电化学沉积行为. 采用扫描电子显微镜和X射线衍射技术,考察了不同试验条件对钴电沉积行为及钴沉积层形貌的影响. 结果表明,当沉积电位达到-0.8 V和沉积电流密度达到-6.0 A·m-2时,温度范围从30 °C到90 °C,添加0.05 mol·L-1的五氧化二磷,可以从脲基和乙二醇基离子液体中沉积得到光滑、发亮和良好结合力的金属光泽钴层. 电化学沉积钴的阴极电流效率达到98%.

本文引用格式

M. Rostom Ali , S Sankar Saha , Md Ziaur Rahman . 共晶基离子液体的钴电化学沉积[J]. 电化学, 2018 , 24(5) : 546 -554 . DOI: 10.13208/j.electrochem.161123

Abstract

The electrodeposition of cobalt from a solution containing cobalt chloride in either a urea-choline chloride based or an ethylene glycol (EG)-choline chloride based ionic liquid has been carried out onto copper and steel cathodes by constant current and constant potential methods at different temperatures. The influences of various experimental conditions on electrodeposition and morphology of the deposited layers have been investigated by scanning electron microscopy (SEM) and X-ray diffraction (XRD)technique. It has been shown that the smooth, shiny with good adherence and bright metallic coloured cobalt coatings were obtained from both urea and EG based ionic liquids at the applied deposition potentials up to -0.8 V and applied deposition current densities up to -6.0 A·m-2 by the addition of 0.05 mol·L-1 P2O5 at temperatures ranging from 30 to 90 ℃. The cathodic current efficiency for the deposition of cobalt reached 98%.

参考文献

[1]  Cui C Q, Jiang S P, Tseung A C C. Electrodeposition of cobalt from aqueous chloride solutions[J]. Journal of The Electrochemical Society, 1990, 137(11): 3418-3423.
[2]  Cui C Q, Jiang S P, Tseung A C C. Mechanism of electrodeposition of cobalt(II) chloride in N,N-dimethylformamide (DMF) solution[J]. Journal of The Electrochemical Society, 1991, 138(1): 94-99.
[3]  Quinn H F, Croll I M. Advances in X-ray analysis[M]. Plenum Press, New York, 1980, 4: 151.
[4]  Croll I M, May B A. Electrodeposition Technology, Theory and Practice, PV 87-17, edited by Romankiw L T, Turner D R. The Electrochemical Society Soft bound Proceedings Series[M].  Pennington, NJ, 1987, 295.
[5]  Ali M R, Nishikata A, Tsuru T. Electrodeposition of Co-Al alloys of different composition from the AlCl3-BPC-CoCl2 room temperature molten salt[J]. Electrochimica Acta, 1997, 42(12): 1819-1828.
[6]  Ali M R, Nishikata A, Tsuru T. Electrodeposition cobalt from cobalt chloride-N-(n-butyl)pyridinium chloride molten salt[J]. Indian Journal of Chemical Technology, 2005, 12: 648-653.
[7]  Sun J, MacFarlane D R, Forsyth M. A new family of ionic liquids based on the 1-alkyl-2-methyl pyrrolinium cation[J]. Electrochimica Acta, 2003, 48: 1707-1711.
[8]  Endres F. Ionic liquids: Solvents for the electrodeposition of metals and semiconductors[J]. A European Journal of Chemical Physics and Physical Chemistry, 2002, 3(2): 145-154.
[9]   Ohno H. Electrochemical aspects of ionic liquids[M]. John Wiley & Sons, New York, 2005.
[10]  Abbott A P, Capper G, Davies D L, et al. Ionic liquid analogues formed from hydrated metal salts[J]. Chemistry-A European Journal, 2004, 10(15): 3769-3774.
[11]  Abbott A P, Boothby D, Capper G, et al. Deep eutectic solvents formed between choline chloride and carboxylic acids: Versatile alternatives to ionic liquids[J]. Journal of American Chemical Society, 2004, 126(29): 9142-9147.
[12]  Abbott A P, McKenzie K J. Application of ionic liquids to the electrodeposition of metals[J]. Physical Chemistry Chemical Physics, 2006, 8(37): 4265-4279.
[13]  Abbott A P, Capper G, Davies D L, et al. Novel solvent properties of choline chloride/urea mixtures[J]. Chemical Communications, 2003, 1: 70-71.
[14]  Abbott A P, Barron J C, Ryder K S, et al. Electrodeposition of zinc using eutectic based ionic liquids[J]. Transactions of the Institute of Metal Finishing, 2009, 87(4): 201-207.
[15]  Abbott A P, Capper G, McKenzie K J, et al. Electrodeposition of zinc-tin alloys from deep eutectic solvents based on choline chloride[J]. Journal of Electroanalytical Chemistry, 2007, 599(2): 288-294.
[16]  Abbott A P, Khalid E T, Gero F, et al. Electrodeposition of copper composites from deep eutectic solvents based on choline chloride[J]. Physical Chemistry Chemical Physics, 2009, 11(21): 4269-4277.
[17]  Ali M R, Rahman M Z, Saha S S. Electrodeposition of copper from a choline chloride based ionic liquid[J]. Journal of Electrochemistry, 2014, 20(2): 139-145.
[18]  Zhang J L, Gu C D, Tong Y Y, et al. Electrodeposition of superhydrophobic Cu film on active substrate from deep eutectic solvent[J]. Journal of The Electrochemical Society, 2015, 162(8): D313-D319.
[19]  Abbott A P, Khalid E T, Ryder K S, et al. Electrodeposition of nickel using eutectic based ionic liquids[J]. Transactions of the Institute of Metal Finishing, 2008, 86(4): 234-240.
[20]  Ali M R, Rahman M Z, Saha S S. Electroless and electrodeposition of nickel from deep eutectic solvents based on choline chloride[J]. Indian Journal of Chemical Technology, 2014, 21: 127-133.
[21]  Gu C D, Tu J P. One-step fabrication of nanostructured Ni film with lotus effect from deep eutectic solvent[J]. Langmuir, 2011, 27(16): 10132-10140.
[22]  Abbott A P, Nandhra S, Postlethwaite S, et al. Electroless deposition of metallic silver from a choline chloride-based ionic liquid: A study using acoustic impedance spectroscopy, SEM and atomic force microscopy[M]. Physical Chemistry Chemical Physics, 2007, 9(28): 3735-3743.
[23]  Ali M R, Rahman M Z, Saha S S. Electroless and electrodeposition of silver from a choline chloride-based ionic liquid[J]. Pakistan Journal of Scientific and Industrial Research Series A: Physical Sciences, 2015, 58(2): 66-73.
[24]  Zhang J L, Gu C D, Fashu S, et al. Enhanced corrosion resistance of Co-Sn alloy coating with a self-organized layered structure electrodeposited from deep eutectic solvent[J]. Journal of The Electrochemical Society, 2015, 162(1): D1-D8.
[25]  You Y, Gu C D, Wang X, et al. Electrochemical synthesis and characterization of Ni-P alloy coatings from eutectic-based ionic liquid[J]. Journal of The Electrochemical Society, 2012, 159(11): D642-D648.
[26]  You Y H, Gu C D, Wang X. Electrodeposition of Ni-Co alloys from a deep eutectic solvent[J]. Surface and coatings technology, 2012, 206(17): 3632-3638.
[27]  Abbott A P, Capper G, McKenzie K J, et al. Voltammetric and impedance studies of the electropolishing of type 316 stainless steel in choline chloride based ionic liquid[J]. Electrochimica Acta, 2006, 51: 4420-4425.
[28]  Abbott A P, Capper G, McKenzie K J, et al. Electropolishing of stainless steels in a choline chloride based ionic liquid: An electrochemical study with surface characterisation using SEM and AFM[J]. Physical Chemistry Chemical Physics, 2006, 8(36): 4214-4221.
[29]  Bard A J, Faulkner L R. Electrochemical methods(2nd edition)[M]. New York: John Wiley & Sons, Inc, 1980: 218.
[30]  Abbott A P, Qui F, Abood H, et al. Double layer, diluent and anodic effects upon the electrodeposition of aluminium from chloroaluminate based ionic liquids[J]. Physical Chemistry Chemical Physics, 2010, 12: 1862-1872.

文章导航

/