通过恒电流和恒电位方法，研究了不同温度下脲-氯化胆硷（氯仿）基或乙二醇-氯化胆硷（氯仿）基离子液体中氯化钴溶液在铜和钢阴极上的钴电化学沉积行为. 采用扫描电子显微镜和X射线衍射技术，考察了不同试验条件对钴电沉积行为及钴沉积层形貌的影响. 结果表明，当沉积电位达到-0.8 V和沉积电流密度达到-6.0 A·m^-2时，温度范围从30 °C到90 °C，添加0.05 mol·L^-1的五氧化二磷，可以从脲基和乙二醇基离子液体中沉积得到光滑、发亮和良好结合力的金属光泽钴层. 电化学沉积钴的阴极电流效率达到98%.

The electrodeposition of cobalt from a solution containing cobalt chloride in either a urea-choline chloride based or an ethylene glycol (EG)-choline chloride based ionic liquid has been carried out onto copper and steel cathodes by constant current and constant potential methods at different temperatures. The influences of various experimental conditions on electrodeposition and morphology of the deposited layers have been investigated by scanning electron microscopy (SEM) and X-ray diffraction (XRD)technique. It has been shown that the smooth, shiny with good adherence and bright metallic coloured cobalt coatings were obtained from both urea and EG based ionic liquids at the applied deposition potentials up to -0.8 V and applied deposition current densities up to -6.0 A·m^-2 by the addition of 0.05 mol·L^-1 P₂O₅ at temperatures ranging from 30 to 90 ℃. The cathodic current efficiency for the deposition of cobalt reached 98%.