1-丁基-3-甲基咪唑醋酸盐和水组成的混合电解液中三价铬电沉积铬的研究
收稿日期: 2016-11-25
修回日期: 2017-02-07
网络出版日期: 2017-03-01
基金资助
安徽省石油化工新材料协同创新中心资助
Electrochemical Deposition of Cr from Cr3+ in the Mixed Electrolyte of [BMIM]OAc/H2O
Received date: 2016-11-25
Revised date: 2017-02-07
Online published: 2017-03-01
本文在[BMIM]OAc-H2O电解液中研究了Cr3+的电沉积反应. 经循环伏安研究表明, Cr3+的还原属于受扩散控制的分步还原过程, 即Cr3+ + e → Cr2+和Cr2+ + 2e → Cr0. 在40℃下通过Rendle-Sevcik方程计算得到Cr3+的扩散系数为1.2×10-8 cm2/s. 采用计时电流法探讨了Cr的三维瞬时成核机理. 对沉积的铬镀层进行了XRD、SEM表征, 结果表明经600℃氩气保护下煅烧后的镀层由Cr和Cr2O3纳米球状颗粒聚集而成, 其平均粒径为0.48μm. 对40℃,-3.0V条件下所得镀层进行EDX检测,发现Cr与O的能级峰十分明显,其中Cr的质量分数为83.8%. 通过在[BMIM]OAc、[BMIM]BF4和[BMIM]PF6三种离子液体体系中电镀得到的Cr镀层质量的比较, 表明OAc-的确有利于Cr的电沉积.
关键词: 电沉积; 1-丁基-3-甲基咪唑乙酸盐; 三价铬; 铬镀层
罗维 , 钮东方 , 杜荣斌 , 王钧伟 , 汪竹青 , 徐衡 , 张新胜 . 1-丁基-3-甲基咪唑醋酸盐和水组成的混合电解液中三价铬电沉积铬的研究[J]. 电化学, 2017 , 23(3) : 332 -339 . DOI: 10.13208/j.electrochem.161053
[1] Giovanardi R, Orlando G. Chromium electrodeposition from Cr(III) aqueous solutions[J]. Surface & Coatings Technology, 2011, 205(15): 3947-3955.
[2] Quan C, He Y D. Properties of nanocrystalline Cr coatings prepared by cathode plasma electrolytic deposition from trivalent chromium electrolyte[J]. Surface & Coatings Technology, 2015, 269: 319-323.
[3] Li H D(李惠东), Li H Q(李惠琪), Huo W K(霍万库). Study of electrochemical reduction process of trivalent chromiumion[J]. Journal of China Coal Society(煤炭学报), 1997, 22(2): 211-215.
[4] Rao Ch J, Venkatesan K A, et al. Electrochemical behavior of europium (III) in N-butyl- N- methylrrolidinium bis(trifluoromethylsulfonyl)imide[J]. Electrochimica Acta, 2009, 54(20): 4718-4725.
[5] Sun L Y, Brennecke J F. Characterization of imidazolium chloride ionic liquids plus trivalent chromium chloride for chromium electroplating[J]. Industrial & Engineering Chemistry Research, 2015, 54(17): 4879-4890.
[6] Rao Zh, Feng K, Tang B B, et al. Surface decoration of amino-functionalized metal-organic framework/graphene oxide composite onto polydopamine-coated membrance substrate for highly efficient heavy metal removal[J]. ACS Applied Materials & Interfaces, 2017, 9(3), 2594-2605.
[7] Moffat T P. Electrodeposition of Al-Cr metallic glass[J]. Journal of the Electrochemical Society, 1994, 141(9): 115-117.
[8] Ali M R, Nishikata A, Tsuru T. Electrodeposition of aluminum-chromium alloys from AlCl3-BPC melt and its corrosion and high temperature oxidation behaviors[J]. Electrochimica Acta, 1997, 42[15]: 2347-2354.
[9] Abbott P, Capper G, Davies D L. Ionic liquid analogues formed from hydrated metal salts[J]. Chemistry-A European Journal, 2004, 10(15): 3769-3774.
[10] Zeng Z X, Sun Y L, Zhang J Y. The electrochemical reduction mechanism of trivalent chromium in the presence of formic acid[J]. Electrochemistry Communications, 2009, 11(2): 331-334.
[11] Liu F S, Li L, Yu S T, et al. Methanolysis of polycarbonate catalysed by ionic liquid [Bmim][Ac][J]. Journal of Hazardous Materials, 2011, 189(1-2): 249-254.
[12] Fredlake C P, Crosthwaite J M, Hert D G, et al. Thermophysical Properties of Imidazolium-Based Ionic Liquids[J]. Journal of Chemical and Engineering Data, 2004, 49(4): 954-964.
[13] Bakkar A, Neubert V. A new method for practical electrodeposition of aluminium from ionic liquids[J]. Electrochemistry Communications, 2015, 51: 113-116.
[14] He P, Liu H T, Li Z Y, et al. Electrochemical deposition of silver in room-temperature ionic liquids and its surface-enhanced Raman scattering effect[J]. Langmuir, 2004, 20(23): 10260-10267.
[15] Eugénio S, Rangel C M, Vilar R, et al. Electrochemical aspects of black chromium electrodeposition from 1-?butyl-?3-?methylimidazolium tetrafluoroborate ionic liquid[J]. Electrochimica Acta, 2011, 56(28): 10347-10352.
[16] Survilien S, Eugénio S, Vilar R. Chromium Electrodeposition from [BMIM][BF4] ionic liquid[J]. Journal of Applied Electrochemistry, 2011, 41(1): 107-114.
[17] He X K, Hou B L, Li C,et al. Electrochemical mechanism of trivalent chromium reduction in 1-butyl-3-methylimidazolium bromide ionic liquid[J]. Electrochimica Acta, 2014, 130: 245-252.
[18] Delahay P. Theory of irreversible waves in oscillographic polarography[J]. Journal of the American Chemical Society, 1953, 75: 1190-6.
[19] Bard A J, Faulkner L R. Electrochemical Methods: Fundamental and Applications, 2nd ed. [M]. Wiley, New York, 2001.
[20] Gunawardena G, Hills G, Montenegro T, et al. Electrochemical nucleation: Part I. General considerations[J]. Journal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1982, 138(2): 225-239.
[21] Yang Y F(杨余芳), Gong Zh Q(龚竹青), Li Q G(李强国), Electrochemical deposition od trivalent chromium[J]. Journal of Central South University of Technology(中南大学学报), 2008, 39(1): 112-117
[22] Scharifker B, Hills G. Theoretical and experimental studies of multiple nucleation[J]. Electrochimica Acta, 1983, 28(7): 879-891.
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